Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/5510
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dc.contributor.authorDimitrov, V.I.-
dc.contributor.authorD'HAEN, Jan-
dc.contributor.authorKNUYT, Gilbert-
dc.contributor.authorQUAEYHAEGENS, Carl-
dc.contributor.authorSTALS, Lambert-
dc.date.accessioned2007-12-20T15:59:27Z-
dc.date.available2007-12-20T15:59:27Z-
dc.date.issued1998-
dc.identifier.citationSurface and coatings technology, 99. p. 234-241-
dc.identifier.urihttp://hdl.handle.net/1942/5510-
dc.titleA method for the determination of the effective diffusion coefficient and sputtering rate during plasma diffusion treatment-
dc.typeJournal Contribution-
dc.identifier.epage241-
dc.identifier.spage234-
dc.identifier.volume99-
local.type.specifiedArticle-
dc.bibliographicCitation.oldjcat-
dc.identifier.doi10.1016/S0257-8972(97)00530-6-
item.fullcitationDimitrov, V.I.; D'HAEN, Jan; KNUYT, Gilbert; QUAEYHAEGENS, Carl & STALS, Lambert (1998) A method for the determination of the effective diffusion coefficient and sputtering rate during plasma diffusion treatment. In: Surface and coatings technology, 99. p. 234-241.-
item.accessRightsClosed Access-
item.contributorDimitrov, V.I.-
item.contributorD'HAEN, Jan-
item.contributorKNUYT, Gilbert-
item.contributorQUAEYHAEGENS, Carl-
item.contributorSTALS, Lambert-
item.fulltextNo Fulltext-
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