KESTERS, Els

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KESTERS, Els
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els.kesters@uhasselt.be
 
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Author:  Vereecke, G.
Author:  Bebelman, S.

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Issue DateTitleContributor(s)TypeCat.
12008Chemical and structural modifications in a 193-nm photoresist after low-k dry etchKESTERS, Els; Claes, M.; Le, Q.T.; Lux, M.; Franquet, A.; Vereecke, G.; Mertens, P.W.; Frank, M.M.; CARLEER, Robert; ADRIAENSENS, Peter; Biebuyk, J.J.; Bebelman, S.Journal ContributionA1