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http://hdl.handle.net/1942/10293
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DC Field | Value | Language |
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dc.contributor.author | Smeets, D. | - |
dc.contributor.author | VANHOYLAND, Geert | - |
dc.contributor.author | D'HAEN, Jan | - |
dc.contributor.author | Vantomme, A. | - |
dc.date.accessioned | 2010-01-07T15:06:24Z | - |
dc.date.available | 2010-01-07T15:06:24Z | - |
dc.date.issued | 2009 | - |
dc.identifier.citation | JOURNAL OF PHYSICS D-APPLIED PHYSICS, 42(23) | - |
dc.identifier.issn | 0022-3727 | - |
dc.identifier.uri | http://hdl.handle.net/1942/10293 | - |
dc.description.abstract | We have accurately determined the thermal expansion coefficients of CoSi2 and NiSi2 using high-temperature x-ray diffraction in the temperature range 300-850 K, resolving the ambiguity in the values reported in the literature. The room temperature (298 K) linear thermal expansion coefficients (alpha = (1/a(0))(partial derivative a/partial derivative T)) for CoSi2 and NiSi2 are found to be alpha CoSi2 = 14.4 +/- 0.6 x 10(-6)K(-1) and alpha(NiSi2) = 14.4 +/- 0.7 x 10(-6) K-1, respectively. Our results, however, strongly suggest that the thermal expansion coefficient of NiSi2 is temperature dependent and we recommend to use alpha(NiSi2) (T) = [(14.3 +/- 0.5) + (0.006 +/- 0.002) (T - 273K)] x 10(-6) K-1 whenever an accurate value of the NiSi2 thermal expansion coefficient is needed. | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | On the thermal expansion coefficient of CoSi2 and NiSi2 | - |
dc.type | Journal Contribution | - |
dc.identifier.issue | 23 | - |
dc.identifier.volume | 42 | - |
local.format.pages | 7 | - |
local.bibliographicCitation.jcat | A1 | - |
dc.description.notes | [Smeets, D.; Vantomme, A.] Katholieke Univ Leuven, Inst Kern & Stralingsfys, B-3001 Louvain, Belgium. [Smeets, D.; Vantomme, A.] Katholieke Univ Leuven, INPAC, B-3001 Louvain, Belgium. [Vanhoyland, G.; D'Haen, J.] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Vanhoyland, G.; D'Haen, J.] IMEC VZW, Div IMOMEC, Diepenbeek, Belgium. | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.bibliographicCitation.oldjcat | A1 | - |
dc.identifier.doi | 10.1088/0022-3727/42/23/235402 | - |
dc.identifier.isi | 000271855000033 | - |
item.accessRights | Closed Access | - |
item.fullcitation | Smeets, D.; VANHOYLAND, Geert; D'HAEN, Jan & Vantomme, A. (2009) On the thermal expansion coefficient of CoSi2 and NiSi2. In: JOURNAL OF PHYSICS D-APPLIED PHYSICS, 42(23). | - |
item.contributor | Smeets, D. | - |
item.contributor | VANHOYLAND, Geert | - |
item.contributor | D'HAEN, Jan | - |
item.contributor | Vantomme, A. | - |
item.fulltext | No Fulltext | - |
item.validation | ecoom 2010 | - |
crisitem.journal.issn | 0022-3727 | - |
crisitem.journal.eissn | 1361-6463 | - |
Appears in Collections: | Research publications |
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