Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/10667
Full metadata record
DC FieldValueLanguage
dc.contributor.authorVoigt, Monika M.-
dc.contributor.authorGuite, Alexander-
dc.contributor.authorChung, Dae-Young-
dc.contributor.authorKhan, Rizwan U. A.-
dc.contributor.authorCampbell, Alasdair J.-
dc.contributor.authorBradley, Donal D. C.-
dc.contributor.authorMeng, Fanshun-
dc.contributor.authorSteinke, Joachim H. G.-
dc.contributor.authorTierney, Steve-
dc.contributor.authorMcCulloch, Iain-
dc.contributor.authorPENXTEN, Huguette-
dc.contributor.authorLUTSEN, Laurence-
dc.contributor.authorDOUHERET, Olivier-
dc.contributor.authorMANCA, Jean-
dc.contributor.authorBrokmann, Ulrike-
dc.contributor.authorSoennichsen, Karin-
dc.contributor.authorHuelsenberg, Dagmar-
dc.contributor.authorBock, Wolfgang-
dc.contributor.authorBarron, Cecile-
dc.contributor.authorBlanckaert, Nicolas-
dc.contributor.authorSpringer, Simon-
dc.contributor.authorGrupp, Joachim-
dc.contributor.authorMosley, Alan-
dc.date.accessioned2010-03-04T10:37:16Z-
dc.date.available2010-03-04T10:37:16Z-
dc.date.issued2010-
dc.identifier.citationADVANCED FUNCTIONAL MATERIALS, 20(2). p. 239-246-
dc.identifier.issn1616-301X-
dc.identifier.urihttp://hdl.handle.net/1942/10667-
dc.description.abstractThe mass production technique of gravure contact printing is used to fabricate state-of-the art polymer field-effect transistors (FETs). Using plastic substrates with prepatterned indium tin oxide source and drain contacts as required for display applications, four different layers are sequentially gravure-printed: the semiconductor poly(3-hexylthiophene-2,5-diyl) (P3HT), two insulator layers, and an Ag gate. A crosslinkable insulator and an Ag ink are developed which are both printable and highly robust. Printing in ambient and using this bottom-contact/top-gate geometry, an on/off ratio of >10(4) and a mobility of 0.04 cm(2) V-1 s(-1) are achieved. This rivals the best top-gate polymer FETs fabricated with these materials. Printing using low concentration, low viscosity ink formulations, and different P3HT molecular weights is demonstrated. The printing speed of 40 m min(-1) on a flexible polymer substrate demonstrates that very high-volume, reel-to-reel production of organic electronic devices is possible.-
dc.description.sponsorshipThe authors thank the European Commission for funding this work (Contact Printing of Electronics and Opto-Electronics/FP6/511562). The authors also thank the UK EPSRC for funding A. Guite. Further we would like to thank Jingsong Huang and Feng Yan for contributions to the project and valuable discussions, Norbert Schlafli Maschinen, Switzerland, for the delivery of printing plates and valuable information on gravure printing and jenny Nelson for useful discussions regarding the manuscript.-
dc.language.isoen-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.titlePolymer Field-Effect Transistors Fabricated by the Sequential Gravure Printing of Polythiophene, Two Insulator Layers, and a Metal Ink Gate-
dc.typeJournal Contribution-
dc.identifier.epage246-
dc.identifier.issue2-
dc.identifier.spage239-
dc.identifier.volume20-
local.format.pages8-
local.bibliographicCitation.jcatA1-
dc.description.notes[Voigt, Monika M.; Guite, Alexander; Chung, Dae-Young; Khan, Rizwan U. A.; Campbell, Alasdair J.; Bradley, Donal D. C.] Univ London Imperial Coll Sci Technol & Med, Expt Solid State Grp, Blackett Lab, London SW7 2AZ, England. [Voigt, Monika M.; Guite, Alexander; Chung, Dae-Young; Khan, Rizwan U. A.; Campbell, Alasdair J.; Bradley, Donal D. C.] Univ London Imperial Coll Sci Technol & Med, Ctr Plast Elect, Dept Phys, Blackett Lab, London SW7 2AZ, England. [Meng, Fanshun; Steinke, Joachim H. G.] Univ London Imperial Coll Sci Technol & Med, Dept Chem, London SW7 2AY, England. [Tierney, Steve; McCulloch, Iain] Merck Chem, Southampton SO16 7QD, Hants, England. [Penxten, Huguette; Lutsen, Laurence; Douheret, Olivier; Manca, Jean] Hasselt Univ, Inst Mat Res, Div IMOMEC IMEC, B-3590 Diepenbeek, Belgium. [Brokmann, Ulrike; Soennichsen, Karin; Huelsenberg, Dagmar] Tech Univ Ilmenau, D-98684 Ilmenau, Germany. [Bock, Wolfgang] Norbert Schlafli Maschinen, CH-4800 Zofingen, Switzerland. [Barron, Cecile; Blanckaert, Nicolas; Springer, Simon; Grupp, Joachim] Swatch Grp R&D SA Asulab, CH-2074 Marin, Switzerland. [Mosley, Alan] IC Consultants Ltd, London SW7 2PG, England. m.voigt@imperial.ac.uk; alasdair.campbell@imperial.ac.uk-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.bibliographicCitation.oldjcatA1-
dc.identifier.doi10.1002/adfm.200901597-
dc.identifier.isi000274269300008-
item.fullcitationVoigt, Monika M.; Guite, Alexander; Chung, Dae-Young; Khan, Rizwan U. A.; Campbell, Alasdair J.; Bradley, Donal D. C.; Meng, Fanshun; Steinke, Joachim H. G.; Tierney, Steve; McCulloch, Iain; PENXTEN, Huguette; LUTSEN, Laurence; DOUHERET, Olivier; MANCA, Jean; Brokmann, Ulrike; Soennichsen, Karin; Huelsenberg, Dagmar; Bock, Wolfgang; Barron, Cecile; Blanckaert, Nicolas; Springer, Simon; Grupp, Joachim & Mosley, Alan (2010) Polymer Field-Effect Transistors Fabricated by the Sequential Gravure Printing of Polythiophene, Two Insulator Layers, and a Metal Ink Gate. In: ADVANCED FUNCTIONAL MATERIALS, 20(2). p. 239-246.-
item.contributorVoigt, Monika M.-
item.contributorGuite, Alexander-
item.contributorChung, Dae-Young-
item.contributorKhan, Rizwan U. A.-
item.contributorCampbell, Alasdair J.-
item.contributorBradley, Donal D. C.-
item.contributorMeng, Fanshun-
item.contributorSteinke, Joachim H. G.-
item.contributorTierney, Steve-
item.contributorMcCulloch, Iain-
item.contributorPENXTEN, Huguette-
item.contributorLUTSEN, Laurence-
item.contributorDOUHERET, Olivier-
item.contributorMANCA, Jean-
item.contributorBrokmann, Ulrike-
item.contributorSoennichsen, Karin-
item.contributorHuelsenberg, Dagmar-
item.contributorBock, Wolfgang-
item.contributorBarron, Cecile-
item.contributorBlanckaert, Nicolas-
item.contributorSpringer, Simon-
item.contributorGrupp, Joachim-
item.contributorMosley, Alan-
item.validationecoom 2011-
item.accessRightsRestricted Access-
item.fulltextWith Fulltext-
crisitem.journal.issn1616-301X-
crisitem.journal.eissn1616-3028-
Appears in Collections:Research publications
Files in This Item:
File Description SizeFormat 
voigt 1.pdf
  Restricted Access
Published version794.55 kBAdobe PDFView/Open    Request a copy
Show simple item record

SCOPUSTM   
Citations

109
checked on Sep 2, 2020

WEB OF SCIENCETM
Citations

112
checked on Apr 30, 2024

Page view(s)

130
checked on Sep 7, 2022

Download(s)

96
checked on Sep 7, 2022

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.