Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/11039
Title: Apparent and steady-state etch rates in thin film etching and under-etching of microstructures: I. Modelling
Authors: Van Barel, Gregory 
Mertens, Luc
De Ceuninck, Ward 
Witvrouw, Ann
Issue Date: 2010
Publisher: IOP PUBLISHING LTD
Source: JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 20(5)
Abstract: A general etch rate model is proposed that allows accurate etch rate calculations out of typical ex situ etch rate experiments. This model takes into account the influence of an incubation period during the initial stage of the etching process and the influence of a decreasing etch rate during the rinsing period. Expressions for the apparent etch rate and steady-state etch rate are proposed. This paper is the first part of a set of two. In part II, experimental etch data are obtained, confirming the proposed etch rate model in this work.
Notes: [Mertens, Luc] Karel de Grote Univ Coll, KdG, B-2660 Hoboken, Belgium. [Van Barel, Gregory; Witvrouw, Ann] IMEC VZW, Interuniv Microelect Ctr, B-3001 Louvain, Belgium. [Van Barel, Gregory; De Ceuninck, Ward] Hasselt Univ, Div Mat Phys, B-3590 Diepenbeek, Belgium.
Document URI: http://hdl.handle.net/1942/11039
ISSN: 0960-1317
e-ISSN: 1361-6439
DOI: 10.1088/0960-1317/20/5/055033
ISI #: 000277305000033
Category: A1
Type: Journal Contribution
Validations: ecoom 2011
Appears in Collections:Research publications

Show full item record

SCOPUSTM   
Citations

4
checked on Sep 3, 2020

WEB OF SCIENCETM
Citations

2
checked on May 14, 2022

Page view(s)

48
checked on May 18, 2022

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.