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http://hdl.handle.net/1942/13806
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DC Field | Value | Language |
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dc.contributor.author | RISKIN, Alexander | - |
dc.contributor.author | DE DOBBELAERE, Christopher | - |
dc.contributor.author | SHAN, Lianchen | - |
dc.contributor.author | BOYEN, Hans-Gerd | - |
dc.contributor.author | D'HAEN, Jan | - |
dc.contributor.author | HARDY, An | - |
dc.contributor.author | VAN BAEL, Marlies | - |
dc.date.accessioned | 2012-07-17T13:00:48Z | - |
dc.date.available | 2012-07-17T13:00:48Z | - |
dc.date.issued | 2012 | - |
dc.identifier.citation | JOURNAL OF PHYSICAL CHEMISTRY C, 116 (19), p. 10743-10752 | - |
dc.identifier.issn | 1932-7447 | - |
dc.identifier.uri | http://hdl.handle.net/1942/13806 | - |
dc.description.abstract | We have applied soft lithography for the indirect patterning of micellar poly(styrene-b-2-vinyl pyridine) diblock copolymers loaded with gold chloric acid with a pattern width below a micrometer. A combination of physical and chemical heterogeneities on the substrate induced a selective deposition of the micelles in between the relief structures without the need for additional liftoff or annealing steps. Micelle size, dip coating speed, and height of the relief pattern were identified as important parameters to achieve a successful selective deposition. Finally, a single layer of patterned gold nanoparticles was formed inside the micropattern using an oxygen plasma treatment. | - |
dc.description.sponsorship | IWT Vlaanderen (SBO-METACEL); Methusalem (Program "NANO"); FWO Vlaanderen G034609N | - |
dc.language.iso | en | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.rights | © 2012 American Chemical Society. | - |
dc.subject.other | carbon nanotubes; metallic nanodots; block-copolymers; soft lithography; ordered arrays; cvd synthesis; resonance; growth; resist; films | - |
dc.title | Dewetting of Patterned Silicon Substrates Leading to a Selective Deposition of Micellar-Based Nanoparticles | - |
dc.type | Journal Contribution | - |
dc.identifier.epage | 10752 | - |
dc.identifier.issue | 19 | - |
dc.identifier.spage | 10743 | - |
dc.identifier.volume | 116 | - |
local.format.pages | 10 | - |
local.bibliographicCitation.jcat | A1 | - |
dc.description.notes | [Riskin, A.; De Dobbelaere, C.; Shan, L.; Boyen, H. G.; D'Haen, J.; Hardy, A.; van Bael, M. K.] Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium. [Shan, L.; Boyen, H. G.; D'Haen, J.; van Bael, M. K.] Imec Vzw Div IMOMEC, B-3590 Diepenbeek, Belgium. | - |
local.publisher.place | WASHINGTON | - |
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Math. 1982, 16, 209−221.(46) Weigl, F.; Fricker, S.; Boyen, H.-G.; Dietrich, C.; Koslowski, B.; Plettl, A.; Pursche, O.; Ziemann, P.; Walther, P.; Hartmann, C. Diamond Relat. Mater. 2006, 15, 1689−1694. | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.bibliographicCitation.oldjcat | A1 | - |
dc.identifier.doi | 10.1021/jp211775q | - |
dc.identifier.isi | 000304073700038 | - |
item.accessRights | Restricted Access | - |
item.validation | ecoom 2013 | - |
item.fulltext | With Fulltext | - |
item.fullcitation | RISKIN, Alexander; DE DOBBELAERE, Christopher; SHAN, Lianchen; BOYEN, Hans-Gerd; D'HAEN, Jan; HARDY, An & VAN BAEL, Marlies (2012) Dewetting of Patterned Silicon Substrates Leading to a Selective Deposition of Micellar-Based Nanoparticles. In: JOURNAL OF PHYSICAL CHEMISTRY C, 116 (19), p. 10743-10752. | - |
item.contributor | RISKIN, Alexander | - |
item.contributor | DE DOBBELAERE, Christopher | - |
item.contributor | SHAN, Lianchen | - |
item.contributor | BOYEN, Hans-Gerd | - |
item.contributor | D'HAEN, Jan | - |
item.contributor | HARDY, An | - |
item.contributor | VAN BAEL, Marlies | - |
crisitem.journal.issn | 1932-7447 | - |
crisitem.journal.eissn | 1932-7455 | - |
Appears in Collections: | Research publications |
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Dewetting of patterned sillicon substrates.pdf Restricted Access | Published version | 6.33 MB | Adobe PDF | View/Open Request a copy |
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