Please use this identifier to cite or link to this item:
http://hdl.handle.net/1942/14442
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | POBEDINSKAS, Paulius | - |
dc.contributor.author | BOLSEE, Jean-Christophe | - |
dc.contributor.author | DEXTERS, Wim | - |
dc.contributor.author | RUTTENS, Bart | - |
dc.contributor.author | MORTET, Vincent | - |
dc.contributor.author | D'HAEN, Jan | - |
dc.contributor.author | MANCA, Jean | - |
dc.contributor.author | HAENEN, Ken | - |
dc.date.accessioned | 2012-12-10T09:27:50Z | - |
dc.date.available | 2012-12-10T09:27:50Z | - |
dc.date.issued | 2012 | - |
dc.identifier.citation | THIN SOLID FILMS, 522, p. 180-185 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | http://hdl.handle.net/1942/14442 | - |
dc.description.abstract | Thin aluminium nitride (AIN) films of different thickness are deposited by DC-pulsed magnetron sputtering under identical conditions on sapphire (0001) and silicon (100) substrates. An investigation of the residual stress, morphology and structural properties is carried out. The thickness of the films covers the range from 17 nm to 3.9 μm. A higher compressive residual stress is measured for the thinner films and the presence of a stress gradient is proven. X-ray diffraction (XRD) studies show that all AIN films are achieved with perfect c-axis orientation perpendicular to the film surface and that the films are biaxially strained. XRD rocking curves reveal that AIN films on sapphire are highly oriented for all film thicknesses, whereas AIN film growth on silicon starts highly disoriented and the film quality improves with film thickness. Surface analysis by atomic force microscopy shows a continuous film roughening and decrease of grain boundary density with increasing film thickness. | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject.other | Residual stress; Physical vapor deposition; Aluminum nitride; AlN | - |
dc.subject.other | Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter; residual stress; physical vapor deposition; aluminium nitride; AIN | - |
dc.title | Thickness dependent residual stress in sputtered AlN thin films | - |
dc.type | Journal Contribution | - |
local.bibliographicCitation.conferencedate | JUN, 2011 | - |
local.bibliographicCitation.conferencename | EMRS Symposium Q on Engineering of Wide Bandgap Semiconductor Materials for Energy Saving | - |
local.bibliographicCitation.conferenceplace | Nice, FRANCE | - |
dc.identifier.epage | 185 | - |
dc.identifier.spage | 180 | - |
dc.identifier.volume | 522 | - |
local.format.pages | 6 | - |
local.bibliographicCitation.jcat | A1 | - |
dc.description.notes | [Pobedinskas, Paulius; Bolsee, Jean-Christophe; Dexters, Wim; Ruttens, Bart; Mortet, Vincent; D'Haen, Jan; Manca, Jean V.; Haenen, Ken] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Ruttens, Bart; Mortet, Vincent; D'Haen, Jan; Manca, Jean V.; Haenen, Ken] IMEC VZW, IMOMEC, B-3590 Diepenbeek, Belgium. [Mortet, Vincent] Univ Toulouse, CNRS, LAAS, F-31077 Toulouse, France. | - |
local.publisher.place | LAUSANNE | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.bibliographicCitation.oldjcat | A1 | - |
dc.identifier.doi | 10.1016/j.tsf.2012.08.015 | - |
dc.identifier.isi | 000310782000035 | - |
item.fulltext | With Fulltext | - |
item.contributor | POBEDINSKAS, Paulius | - |
item.contributor | BOLSEE, Jean-Christophe | - |
item.contributor | DEXTERS, Wim | - |
item.contributor | RUTTENS, Bart | - |
item.contributor | MORTET, Vincent | - |
item.contributor | D'HAEN, Jan | - |
item.contributor | MANCA, Jean | - |
item.contributor | HAENEN, Ken | - |
item.accessRights | Restricted Access | - |
item.validation | ecoom 2013 | - |
item.fullcitation | POBEDINSKAS, Paulius; BOLSEE, Jean-Christophe; DEXTERS, Wim; RUTTENS, Bart; MORTET, Vincent; D'HAEN, Jan; MANCA, Jean & HAENEN, Ken (2012) Thickness dependent residual stress in sputtered AlN thin films. In: THIN SOLID FILMS, 522, p. 180-185. | - |
crisitem.journal.issn | 0040-6090 | - |
crisitem.journal.eissn | 1879-2731 | - |
Appears in Collections: | Research publications |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
pobedinskas 1.pdf Restricted Access | Published version | 871.96 kB | Adobe PDF | View/Open Request a copy |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.