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http://hdl.handle.net/1942/1459
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DC Field | Value | Language |
---|---|---|
dc.contributor.author | DAMS, Roel | - |
dc.contributor.author | VANGENEUGDEN, Dirk | - |
dc.contributor.author | VANDERZANDE, Dirk | - |
dc.date.accessioned | 2007-05-04T12:34:16Z | - |
dc.date.available | 2007-05-04T12:34:16Z | - |
dc.date.issued | 2006 | - |
dc.identifier.citation | CHEMICAL VAPOR DEPOSITION, 12(12). p. 719-727 | - |
dc.identifier.issn | 0948-1907 | - |
dc.identifier.uri | http://hdl.handle.net/1942/1459 | - |
dc.description.abstract | Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3-methylthiophene, and 3,4-ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV-vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4-ethylenedioxythiophene). Conductivities of up to 1 x 10(-2) S cm(-1) are measured. | - |
dc.format.extent | 364449 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.language.iso | en | - |
dc.publisher | Wiley | - |
dc.subject.other | plasma, atmospheric pressure, conjugated polymer, conducting polymer, thiophene | - |
dc.title | Plasma deposition of thiophene derivatives under atmospheric pressure | - |
dc.type | Journal Contribution | - |
dc.identifier.epage | 727 | - |
dc.identifier.issue | 12 | - |
dc.identifier.spage | 719 | - |
dc.identifier.volume | 12 | - |
local.bibliographicCitation.jcat | A1 | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.bibliographicCitation.oldjcat | A1 | - |
dc.identifier.doi | 10.1002/cvde.200606483 | - |
dc.identifier.isi | 000243466000005 | - |
item.contributor | DAMS, Roel | - |
item.contributor | VANGENEUGDEN, Dirk | - |
item.contributor | VANDERZANDE, Dirk | - |
item.accessRights | Open Access | - |
item.fullcitation | DAMS, Roel; VANGENEUGDEN, Dirk & VANDERZANDE, Dirk (2006) Plasma deposition of thiophene derivatives under atmospheric pressure. In: CHEMICAL VAPOR DEPOSITION, 12(12). p. 719-727. | - |
item.fulltext | With Fulltext | - |
item.validation | ecoom 2008 | - |
crisitem.journal.issn | 0948-1907 | - |
Appears in Collections: | Research publications |
Files in This Item:
File | Description | Size | Format | |
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Plasma Deposition.pdf | Peer-reviewed author version | 355.91 kB | Adobe PDF | View/Open |
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