Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/15420
Full metadata record
DC FieldValueLanguage
dc.contributor.authorLanche, Ruben-
dc.contributor.authorDELLE, Lotta-
dc.contributor.authorWeil, Maryam-
dc.contributor.authorXuan Thang, Vu-
dc.contributor.authorPachauri, Vivek-
dc.contributor.authorMunief, Walid M.-
dc.contributor.authorWAGNER, Patrick-
dc.contributor.authorIngebrandt, Sven-
dc.date.accessioned2013-08-21T09:31:35Z-
dc.date.available2013-08-21T09:31:35Z-
dc.date.issued2013-
dc.identifier.citationPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 210 (5), p. 968-974-
dc.identifier.issn1862-6300-
dc.identifier.urihttp://hdl.handle.net/1942/15420-
dc.description.abstractA method for the routine fabrication of graphene (reduced graphene oxide (r-GO)) based devices is reported. We describe a solution-based technique for the fabrication of the devices on alternative substrates and subsequent on-substrate processing of graphene oxide into reduced graphene oxide. As sensor platform we mainly used interdigitated gold electrodes forming microarray structures on glass substrates. Graphene oxide was site-specifically deposited onto microelectrode arrays by dielectrophoresis followed by a solution-based reduction of graphene oxide with L-ascorbic acid. In order to test the r-GO sensor stability and performance, impedance spectroscopy was used. The optimized all solution processed fabrication provides an attractive fabrication route for robust r-GO microarray devices in a flexible, scalable and cost-effective approach. Schematics for a microarray chip based on reduced graphene oxide.-
dc.language.isoen-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subject.otherdielectrophoresis; graphene; impedance spectroscopy; interdigitated electrodes-
dc.subject.otherMaterials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter-
dc.titleRoutine fabrication of reduced graphene oxide microarray devices via all solution processing-
dc.typeJournal Contribution-
dc.identifier.epage974-
dc.identifier.issue5-
dc.identifier.spage968-
dc.identifier.volume210-
local.format.pages7-
local.bibliographicCitation.jcatA1-
dc.description.notesUniv Appl Sci Kaiserslautern, Dept Informat & Microsyst Technol, D-66482 Zweibrucken, Germany. Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium.-
local.publisher.placeWEINHEIM-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.identifier.doi10.1002/pssa.201200910-
dc.identifier.isi000319151900023-
item.validationecoom 2014-
item.fulltextWith Fulltext-
item.contributorLanche, Ruben-
item.contributorDELLE, Lotta-
item.contributorWeil, Maryam-
item.contributorXuan Thang, Vu-
item.contributorPachauri, Vivek-
item.contributorMunief, Walid M.-
item.contributorWAGNER, Patrick-
item.contributorIngebrandt, Sven-
item.accessRightsRestricted Access-
item.fullcitationLanche, Ruben; DELLE, Lotta; Weil, Maryam; Xuan Thang, Vu; Pachauri, Vivek; Munief, Walid M.; WAGNER, Patrick & Ingebrandt, Sven (2013) Routine fabrication of reduced graphene oxide microarray devices via all solution processing. In: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 210 (5), p. 968-974.-
crisitem.journal.issn1862-6300-
crisitem.journal.eissn1862-6319-
Appears in Collections:Research publications
Files in This Item:
File Description SizeFormat 
lanche 1.pdf
  Restricted Access
Published version757.8 kBAdobe PDFView/Open    Request a copy
Show simple item record

SCOPUSTM   
Citations

13
checked on Nov 4, 2025

WEB OF SCIENCETM
Citations

12
checked on Nov 2, 2025

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.