Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/15420
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dc.contributor.authorLanche, Ruben-
dc.contributor.authorDELLE, Lotta-
dc.contributor.authorWeil, Maryam-
dc.contributor.authorXuan Thang, Vu-
dc.contributor.authorPachauri, Vivek-
dc.contributor.authorMunief, Walid M.-
dc.contributor.authorWAGNER, Patrick-
dc.contributor.authorIngebrandt, Sven-
dc.date.accessioned2013-08-21T09:31:35Z-
dc.date.available2013-08-21T09:31:35Z-
dc.date.issued2013-
dc.identifier.citationPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 210 (5), p. 968-974-
dc.identifier.issn1862-6300-
dc.identifier.urihttp://hdl.handle.net/1942/15420-
dc.description.abstractA method for the routine fabrication of graphene (reduced graphene oxide (r-GO)) based devices is reported. We describe a solution-based technique for the fabrication of the devices on alternative substrates and subsequent on-substrate processing of graphene oxide into reduced graphene oxide. As sensor platform we mainly used interdigitated gold electrodes forming microarray structures on glass substrates. Graphene oxide was site-specifically deposited onto microelectrode arrays by dielectrophoresis followed by a solution-based reduction of graphene oxide with L-ascorbic acid. In order to test the r-GO sensor stability and performance, impedance spectroscopy was used. The optimized all solution processed fabrication provides an attractive fabrication route for robust r-GO microarray devices in a flexible, scalable and cost-effective approach. Schematics for a microarray chip based on reduced graphene oxide.-
dc.language.isoen-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subject.otherdielectrophoresis; graphene; impedance spectroscopy; interdigitated electrodes-
dc.subject.otherMaterials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter-
dc.titleRoutine fabrication of reduced graphene oxide microarray devices via all solution processing-
dc.typeJournal Contribution-
dc.identifier.epage974-
dc.identifier.issue5-
dc.identifier.spage968-
dc.identifier.volume210-
local.format.pages7-
local.bibliographicCitation.jcatA1-
dc.description.notesUniv Appl Sci Kaiserslautern, Dept Informat & Microsyst Technol, D-66482 Zweibrucken, Germany. Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium.-
local.publisher.placeWEINHEIM-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.identifier.doi10.1002/pssa.201200910-
dc.identifier.isi000319151900023-
item.fulltextWith Fulltext-
item.contributorLanche, Ruben-
item.contributorDELLE, Lotta-
item.contributorWeil, Maryam-
item.contributorXuan Thang, Vu-
item.contributorPachauri, Vivek-
item.contributorMunief, Walid M.-
item.contributorWAGNER, Patrick-
item.contributorIngebrandt, Sven-
item.fullcitationLanche, Ruben; DELLE, Lotta; Weil, Maryam; Xuan Thang, Vu; Pachauri, Vivek; Munief, Walid M.; WAGNER, Patrick & Ingebrandt, Sven (2013) Routine fabrication of reduced graphene oxide microarray devices via all solution processing. In: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 210 (5), p. 968-974.-
item.accessRightsRestricted Access-
item.validationecoom 2014-
crisitem.journal.issn1862-6300-
crisitem.journal.eissn1862-6319-
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