Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/16441
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dc.contributor.authorFabianska, Aleksandra-
dc.contributor.authorBogdanowicz, Robert-
dc.contributor.authorZieba, Patrycja-
dc.contributor.authorOssowski, Tadeusz-
dc.contributor.authorGnyba, Marcin-
dc.contributor.authorRyl, Jacek-
dc.contributor.authorZielinski, Artur-
dc.contributor.authorJANSSENS, Stoffel-
dc.contributor.authorHAENEN, Ken-
dc.contributor.authorSiedlecka, Ewa M.-
dc.date.accessioned2014-03-18T13:40:30Z-
dc.date.available2014-03-18T13:40:30Z-
dc.date.issued2013-
dc.identifier.citationPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 210 (10), p. 2040-2047-
dc.identifier.issn1862-6300-
dc.identifier.urihttp://hdl.handle.net/1942/16441-
dc.description.abstractThe boron-doped diamond (BDD) electrodes with different boron concentrations have been tested as electrode material for sulphamerazine (SRM) oxidation in water solution. An investigation of the electrode morphology and molecular structure was carried out using high resolution scanning electron microscopy (SEM) and Raman spectroscopy. Electrochemical results showed clearly that the kinetics and efficiency of sulphonamide oxidation were dependent on the amount of boron incorporated in a diamond film. The mechanism of sulphonamide oxidation was also analysed by cycle voltammograms and by identifying oxidative species (center dot OH radicals) which take part in the degradation process. The aging of the material during the operation was also studied.-
dc.description.sponsorshipThis work was supported by the National Centre for Research and Development (NCBiR) under project no. LIDER/20/91/L-2/10. The DS/530-8150-D199-12-1F and DS/530-8210-D181-121F and DS funds of Faculty of Electronics, Telecommunications and Informatics of the Gdansk University of Technology are also acknowledged. Authors would also like to thank Michal Sobaszek and Lukasz Golunski for fruitful discussions and productive research collaboration.-
dc.language.isoen-
dc.rights© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.-
dc.subject.otherboron-doped diamond electrode; electrochemical oxidation; microwave plasma chemical vapour deposition; sulphametoxazole degradation-
dc.titleElectrochemical oxidation of sulphamerazine at boron-doped diamond electrodes: Influence of boron concentration-
dc.typeJournal Contribution-
dc.identifier.epage2047-
dc.identifier.issue10-
dc.identifier.spage2040-
dc.identifier.volume210-
local.bibliographicCitation.jcatA1-
dc.description.notesBogdanowicz, R (reprint author), Gdansk Univ Technol, Fac Elect Telecommun & Informat, Dept Metrol & Optoelect, 11-12 G Narutowicza Str, PL-80233 Gdansk, Poland. rbogdan@eti.pg.gda.pl; ewas@chem.univ.gda.pl-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.identifier.doi10.1002/pssa.201300094-
dc.identifier.isi000329299700016-
item.fulltextWith Fulltext-
item.contributorFabianska, Aleksandra-
item.contributorBogdanowicz, Robert-
item.contributorZieba, Patrycja-
item.contributorOssowski, Tadeusz-
item.contributorGnyba, Marcin-
item.contributorRyl, Jacek-
item.contributorZielinski, Artur-
item.contributorJANSSENS, Stoffel-
item.contributorHAENEN, Ken-
item.contributorSiedlecka, Ewa M.-
item.fullcitationFabianska, Aleksandra; Bogdanowicz, Robert; Zieba, Patrycja; Ossowski, Tadeusz; Gnyba, Marcin; Ryl, Jacek; Zielinski, Artur; JANSSENS, Stoffel; HAENEN, Ken & Siedlecka, Ewa M. (2013) Electrochemical oxidation of sulphamerazine at boron-doped diamond electrodes: Influence of boron concentration. In: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 210 (10), p. 2040-2047.-
item.accessRightsRestricted Access-
item.validationecoom 2015-
crisitem.journal.issn1862-6300-
crisitem.journal.eissn1862-6319-
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