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http://hdl.handle.net/1942/16748
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DC Field | Value | Language |
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dc.contributor.author | Kahouli, A. | - |
dc.contributor.author | Sylvestre, A. | - |
dc.contributor.author | Laithier, J. -F. | - |
dc.contributor.author | LUTSEN, Laurence | - |
dc.contributor.author | Pairis, S. | - |
dc.contributor.author | Andre, E. | - |
dc.contributor.author | Garden, J. -L. | - |
dc.date.accessioned | 2014-04-30T08:27:03Z | - |
dc.date.available | 2014-04-30T08:27:03Z | - |
dc.date.issued | 2014 | - |
dc.identifier.citation | MATERIALS CHEMISTRY AND PHYSICS, 143 (3), p. 908-914 | - |
dc.identifier.issn | 0254-0584 | - |
dc.identifier.uri | http://hdl.handle.net/1942/16748 | - |
dc.description.abstract | 58% semi-crystalline thin parylene-VT4 (eH2CeC6F4eCH2 )n films, have been investigated by dielectric spectroscopy for temperature and frequency ranges of [ 120 to 380 C] and [0.1e105 Hz] respectively. The study comprises a detailed investigation of the dielectric constant, dielectric loss and AC conductivity of this fluoropolymer. Dielectric behavior of parylene-VT4 is represented by a low dielectric constant with values in the range of 2.05e2.35 while the dielectric losses indicate the presence of two relaxation processes. Maxwell Wagner Sillars (MWS) polarization at the amorphous/crystalline interfaces with activation energy of 1.6 eV is due to the oligomer orientation. Electrical conductivity obeys to the well-known Jonscher law. The plateau in the low frequency part of this conductivity is temperature-dependent and follows an Arrhenius behavior with activation energy of 1.17 eV (deep traps) due to the fluorine diffusion. Due to its thermal stability with a high decomposition temperature (around 400 C under air and 510 C under nitrogen) and due to its good resistivity at low frequency (1015e1017 U m 1), parylene-VT4 constitutes a very attractive polymer for microelectronic applications as low k dielectric. Moreover, when parylene-VT4 is subjected to an annealing, the dielectric properties can be still more improved. | - |
dc.language.iso | en | - |
dc.rights | © 2013 Elsevier B.V. All rights reserved. | - |
dc.subject.other | polymers; thin films; vapor deposition; dielectric properties; annealing | - |
dc.title | Structural and dielectric properties of parylene-VT4 thin films | - |
dc.type | Journal Contribution | - |
dc.identifier.epage | 914 | - |
dc.identifier.issue | 3 | - |
dc.identifier.spage | 908 | - |
dc.identifier.volume | 143 | - |
local.bibliographicCitation.jcat | A1 | - |
dc.description.notes | Kahouli, A (reprint author), [Show the Organization-Enhanced name(s)] Univ Grenoble 1, Grenoble Elect Engn Lab, G INP, CNRS, 25 Rue Martyrs,BP 166, F-38042 Grenoble 9, France. kahouli.kader@gmail.com | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.identifier.doi | 10.1016/j.matchemphys.2013.08.044 | - |
dc.identifier.isi | 000331347500004 | - |
item.contributor | Kahouli, A. | - |
item.contributor | Sylvestre, A. | - |
item.contributor | Laithier, J. -F. | - |
item.contributor | LUTSEN, Laurence | - |
item.contributor | Pairis, S. | - |
item.contributor | Andre, E. | - |
item.contributor | Garden, J. -L. | - |
item.fulltext | With Fulltext | - |
item.fullcitation | Kahouli, A.; Sylvestre, A.; Laithier, J. -F.; LUTSEN, Laurence; Pairis, S.; Andre, E. & Garden, J. -L. (2014) Structural and dielectric properties of parylene-VT4 thin films. In: MATERIALS CHEMISTRY AND PHYSICS, 143 (3), p. 908-914. | - |
item.validation | ecoom 2015 | - |
item.accessRights | Restricted Access | - |
crisitem.journal.issn | 0254-0584 | - |
crisitem.journal.eissn | 1879-3312 | - |
Appears in Collections: | Research publications |
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File | Description | Size | Format | |
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kahouli 1.pdf Restricted Access | Published version | 1.18 MB | Adobe PDF | View/Open Request a copy |
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