Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/16748
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dc.contributor.authorKahouli, A.-
dc.contributor.authorSylvestre, A.-
dc.contributor.authorLaithier, J. -F.-
dc.contributor.authorLUTSEN, Laurence-
dc.contributor.authorPairis, S.-
dc.contributor.authorAndre, E.-
dc.contributor.authorGarden, J. -L.-
dc.date.accessioned2014-04-30T08:27:03Z-
dc.date.available2014-04-30T08:27:03Z-
dc.date.issued2014-
dc.identifier.citationMATERIALS CHEMISTRY AND PHYSICS, 143 (3), p. 908-914-
dc.identifier.issn0254-0584-
dc.identifier.urihttp://hdl.handle.net/1942/16748-
dc.description.abstract58% semi-crystalline thin parylene-VT4 (eH2CeC6F4eCH2 )n films, have been investigated by dielectric spectroscopy for temperature and frequency ranges of [ 120 to 380 C] and [0.1e105 Hz] respectively. The study comprises a detailed investigation of the dielectric constant, dielectric loss and AC conductivity of this fluoropolymer. Dielectric behavior of parylene-VT4 is represented by a low dielectric constant with values in the range of 2.05e2.35 while the dielectric losses indicate the presence of two relaxation processes. Maxwell Wagner Sillars (MWS) polarization at the amorphous/crystalline interfaces with activation energy of 1.6 eV is due to the oligomer orientation. Electrical conductivity obeys to the well-known Jonscher law. The plateau in the low frequency part of this conductivity is temperature-dependent and follows an Arrhenius behavior with activation energy of 1.17 eV (deep traps) due to the fluorine diffusion. Due to its thermal stability with a high decomposition temperature (around 400 C under air and 510 C under nitrogen) and due to its good resistivity at low frequency (1015e1017 U m 1), parylene-VT4 constitutes a very attractive polymer for microelectronic applications as low k dielectric. Moreover, when parylene-VT4 is subjected to an annealing, the dielectric properties can be still more improved.-
dc.language.isoen-
dc.rights© 2013 Elsevier B.V. All rights reserved.-
dc.subject.otherpolymers; thin films; vapor deposition; dielectric properties; annealing-
dc.titleStructural and dielectric properties of parylene-VT4 thin films-
dc.typeJournal Contribution-
dc.identifier.epage914-
dc.identifier.issue3-
dc.identifier.spage908-
dc.identifier.volume143-
local.bibliographicCitation.jcatA1-
dc.description.notesKahouli, A (reprint author), [Show the Organization-Enhanced name(s)] Univ Grenoble 1, Grenoble Elect Engn Lab, G INP, CNRS, 25 Rue Martyrs,BP 166, F-38042 Grenoble 9, France. kahouli.kader@gmail.com-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.identifier.doi10.1016/j.matchemphys.2013.08.044-
dc.identifier.isi000331347500004-
item.validationecoom 2015-
item.contributorKahouli, A.-
item.contributorSylvestre, A.-
item.contributorLaithier, J. -F.-
item.contributorLUTSEN, Laurence-
item.contributorPairis, S.-
item.contributorAndre, E.-
item.contributorGarden, J. -L.-
item.fullcitationKahouli, A.; Sylvestre, A.; Laithier, J. -F.; LUTSEN, Laurence; Pairis, S.; Andre, E. & Garden, J. -L. (2014) Structural and dielectric properties of parylene-VT4 thin films. In: MATERIALS CHEMISTRY AND PHYSICS, 143 (3), p. 908-914.-
item.fulltextWith Fulltext-
item.accessRightsRestricted Access-
crisitem.journal.issn0254-0584-
crisitem.journal.eissn1879-3312-
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