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Title: | Spectroscopic ellipsometry characterization of nano-crystalline diamond films prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery | Authors: | Mistrik, J. Janicek, P. Taylor, A. Fendrych, F. Fekete, L. Jager, A. NESLADEK, Milos |
Issue Date: | 2014 | Publisher: | ELSEVIER SCIENCE SA | Source: | THIN SOLID FILMS, 571, p. 230-237 | Abstract: | A series of nanocrystalline diamond (NCD) films were deposited by a custom made microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery at different substrate temperatures (520-600 degrees C) and pulsed plasma frequencies (2.7-14.3 kHz) in a hydrogen rich working gas mixture of H-2/CH4/CO2. Films were deposited onto naturally oxidized Si wafers pre-seeded with nanodiamond particles. Spectro-ellipsometry characterization of the NCD films was carried out considering various model structures (single and bi-layer models) and various NCD optical constant parameterizations (Tauc-Lorentz and effective medium approximation with different non-diamond component representations). It has been shown that substrate temperature can be lowered with a simultaneous increase in pulsed plasma frequency while still providing high quality NCD films with non-diamond component fraction in the bulk layer of about 5% (identically estimated by ellipsometry and Raman spectroscopy). Films' thickness and their surface roughness were found consistent with atomic force and secondary electron microscopies. Among various NCD structure models the most appropriate has been selected. (C) 2014 Elsevier B.V. All rights reserved. | Notes: | [Mistrik, J.; Janicek, P.] Univ Pardubice, Inst Appl Phys & Math, Pardubice 53210, Czech Republic. [Taylor, A.; Fendrych, F.; Fekete, L.; Jager, A.] Acad Sci Czech Republic, Inst Phys, Vvi, Prague 8, Czech Republic. [Nesladek, M.] Univ Hasselt, Inst Mat Res, IMEC, IMOMEC Div, B-3590 Diepenbeek, Belgium. | Keywords: | Nanocrystalline diamond; Thin films; Microwave plasma-enhanced chemical vapor deposition; Pulsed plasma; Low deposition temperature; Spectroscopic ellipsometry; Raman spectroscopy;nanocrystalline diamond; thin films; microwave plasma-enhanced chemical vapor; deposition; pulsed plasma; low deposition temperature; spectroscopic ellipsometry; Raman spectroscopy | Document URI: | http://hdl.handle.net/1942/18107 | ISSN: | 0040-6090 | e-ISSN: | 1879-2731 | DOI: | 10.1016/j.tsf.2014.10.071 | ISI #: | 000346053900037 | Rights: | © 2014 Elsevier B.V. All rights reserved. | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2016 |
Appears in Collections: | Research publications |
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