Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/19885
Title: Localized dealloying corrosion mediated by self-assembled monolayers used as an inhibitor system
Authors: Shrestha, B. R.
Bashir, Asif
Ankah, Genesis Ngwa
Valtiner, M.
Renner, Frank 
Issue Date: 2015
Publisher: ROYAL SOC CHEMISTRY
Source: FARADAY DISCUSSIONS, 180, p. 191-204
Abstract: The structure and chemistry of thiol or selenol self-assembled organic monolayers have been frequently addressed due to the unique opportunities in functionalization of materials. Such organic films can also act as effective inhibition layers to mitigate oxidation or corrosion. Cu-Au alloy substrates covered by self-assembled monolayers show a different dealloying mechanism compared to bare surfaces. The organic surface layer inhibits dealloying of noble metal alloys by a suppression of surface diffusion at lower potentials but at higher applied potentials dealloying proceeds in localized regions due to passivity breakdown. We present an in situ atomic force microscopy study of a patterned thiol layer applied on Cu-Au alloy surfaces and further explore approaches to change the local composition of the surface layers by exchange of molecules. The pattern for the in situ experiment has been applied by micro-contact printing. This allows the study of corrosion protection with its dependence on different molecule densities at different sites. Low-density thiol areas surrounding the high-density patterns are completely protected and initiation of dealloying proceeds only along the areas with the lowest inhibitor concentration. Dealloying patterns are highly influenced and controlled by molecular thiol to selenol exchange and are also affected by introducing structural defects such as scratches or polishing defects.
Notes: [Shrestha, B. R.; Bashir, A.; Ankah, G. N.; Valtiner, M.; Renner, F. U.] Max Planck Inst Eisenforsch GmbH, D-40237 Dusseldorf, Germany. [Renner, F. U.] Hasselt Univ, IMO, B-3590 Diepenbeek, Belgium.
Document URI: http://hdl.handle.net/1942/19885
ISSN: 1359-6640
e-ISSN: 1364-5498
DOI: 10.1039/c4fd00256c
ISI #: 000358249600010
Rights: This journal is © The Royal Society of Chemistry 2015
Category: A1
Type: Journal Contribution
Validations: ecoom 2016
Appears in Collections:Research publications

Files in This Item:
File Description SizeFormat 
c4fd00256c.pdf
  Restricted Access
1.02 MBAdobe PDFView/Open    Request a copy
Show full item record

SCOPUSTM   
Citations

8
checked on Sep 3, 2020

WEB OF SCIENCETM
Citations

10
checked on May 14, 2022

Page view(s)

54
checked on May 18, 2022

Download(s)

40
checked on May 18, 2022

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.