Please use this identifier to cite or link to this item:
http://hdl.handle.net/1942/21663
Title: | Disordered nanostructures by hole-mask colloidal lithography for advanced light trapping in silicon solar cells | Authors: | Trompoukis, Christos Massiot, Inès DEPAUW, Valerie El Daif, Ounsi Lee, Kidong Dmitriev, Alexandre GORDON, Ivan Mertens, Robert POORTMANS, Jef |
Issue Date: | 2016 | Publisher: | OPTICAL SOC AMER | Source: | OPTICS EXPRESS, 24 (2), p. A191-A201 | Abstract: | We report on the fabrication of disordered nanostructures by combining colloidal lithography and silicon etching. We show good control of the short-range ordered colloidal pattern for a wide range of bead sizes from 170 to 850 nm. The inter-particle spacing follows a Gaussian distribution with the average distance between two neighboring beads (center to center) being approximately twice their diameter, thus enabling the nanopatterning with dimensions relevant to the light wavelength scale. The disordered nanostructures result in a lower integrated reflectance (8.1%) than state-of-the-art random pyramid texturing (11.7%) when fabricated on 700 mu m thick wafers. When integrated in a 1.1 mu m thin crystalline silicon slab, the absorption is enhanced from 24.0% up to 64.3%. The broadening of resonant modes present for the disordered nanopattern offers a more broadband light confinement compared to a periodic nanopattern. Owing to its simplicity, versatility and the degrees of freedom it offers, this potentially low-cost bottom-up nanopatterning process opens perspectives towards the integration of advanced light-trapping schemes in thin solar cells. (C) 2015 Optical Society of America | Notes: | [Trompoukis, Christos; Depauw, Valerie; El Daif, Ounsi; Gordon, Ivan; Mertens, Robert; Poortmans, Jef] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium. [Trompoukis, Christos; Poortmans, Jef] Katholieke Univ Leuven, Dept Elektrotech ESAT, Kasteelpark Arenberg 10, B-3001 Leuven, Belgium. [Massiot, Ines; Dmitriev, Alexandre] Chalmers, Dept Appl Phys, SE-41296 Gothenburg, Sweden. [Lee, Kidong] Obducat Technol AB, Scheelevagen 2, S-22363 Lund, Sweden. [Poortmans, Jef] Univ Hasselt, Martelarenlaan 42, B-3500 Hasselt, Belgium. [Trompoukis, Christos] Univ Ghent, Dept Informat Technol, Photon Res Grp, Sint Pietersnieuwstr 41, B-9000 Ghent, Belgium. [Trompoukis, Christos] Katholieke Univ Leuven, Ctr Surface Chem & Catalysis, Celestijnenlaan 200F Leuven Chem & Tech Post, B-3001 Leuven, Belgium. [El Daif, Ounsi] QEERI, Doha 5825, Qatar. | Document URI: | http://hdl.handle.net/1942/21663 | ISSN: | 1094-4087 | DOI: | 10.1364/OE.24.00A191 | ISI #: | 000369066300020 | Rights: | © 2016 OSA | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2017 |
Appears in Collections: | Research publications |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
trompoukis 1.pdf Restricted Access | Published version | 2.52 MB | Adobe PDF | View/Open Request a copy |
SCOPUSTM
Citations
20
checked on Sep 3, 2020
WEB OF SCIENCETM
Citations
27
checked on Oct 12, 2024
Page view(s)
56
checked on Sep 7, 2022
Download(s)
50
checked on Sep 7, 2022
Google ScholarTM
Check
Altmetric
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.