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Title: | Role of O-2 radicals on silicone plasma treatments for a-Si:H surface passivation of PV wafers bonded to glass | Authors: | Granata, Stefano Nicola Marchegiani, Alessio Bearda, Twan TOUS, Loic Cheyns, David Abdulraheem, Yaser GORDON, Ivan Szlufcik, Jozef Mertens, Robert POORTMANS, Jef |
Issue Date: | 2015 | Publisher: | WILEY-V C H VERLAG GMBH | Source: | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 212(9), p. 1946-1953 | Abstract: | Argon (Ar) and oxygen (O-2) plasmas are performed on silicone adhesives to eliminate the negative influence of silicone on amorphous silicon (a-Si: H) surface passivation of wafers bonded to glass. Both the Ar and O-2 plasmas lead to oxidation of the silicone surface, consisting in an increase of oxygen/carbon ratio, of degree of crosslinking, and of material density. The oxidized silicone is more resilient than pristine and does not interact with the a-Si: H passivation process, allowing for state-of-the-art surface passivation of wafers bonded to glass. Similarities between the modifications induced by the Ar and O-2 plasmas on the silicone indicate the secondary role of the O-2 radicals in the oxidation process. Moreover, amorphous/crystalline heterojunction interdigitated back contact solar cells (a-Si: H/c-Si HJ i-BC) are fabricated on freestanding and bonded wafers treated with Ar plasma. The devices show comparable open-circuit voltages of up to 675 mV, confirming at device level the efficacy of the treatment. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | Notes: | [Granata, Stefano Nicola; Marchegiani, Alessio; Bearda, Twan; Tous, Loic; Cheyns, David; Gordon, Ivan; Szlufcik, Jozef; Poortmans, Jef] IMEC, B-3001 Heverlee, Belgium. [Granata, Stefano Nicola; Mertens, Robert; Poortmans, Jef] Katholieke Univ Leuven, B-3001 Leuven, Belgium. [Marchegiani, Alessio] Politecn Milan, I-20133 Milan, Italy. [Abdulraheem, Yaser] Kuwait Univ, Safat 13060, Kuwait. [Poortmans, Jef] UHasselt, B-3500 Hasselt, Belgium. | Keywords: | amorphous silicon; plasma treatment; polydimethylsiloxane; surface passivation;amorphous silicon; plasma treatment; polydimethylsiloxane; surface passivation | Document URI: | http://hdl.handle.net/1942/22487 | ISSN: | 1862-6300 | e-ISSN: | 1862-6319 | DOI: | 10.1002/pssa.201431945 | ISI #: | 000362950800011 | Rights: | © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2016 |
Appears in Collections: | Research publications |
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