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Title: | Atomic Force Microscopic and Raman Investigation of Boron-Doped Diamond Nanowire Electrodes and Their Activity toward Oxygen Reduction | Authors: | Subramanian, Palaniappan Kolagatla, Srikanth Szunerits, Sabine Coffinier, Yannick YEAP, Weng Siang HAENEN, Ken Boultherroub, Rabah Schechter, Alex |
Issue Date: | 2017 | Publisher: | AMER CHEMICAL SOC | Source: | JOURNAL OF PHYSICAL CHEMISTRY C, 121(6), p. 3397-3403 | Abstract: | Reactive ion etching of diamond interfaces using oxygen plasma is a widely used approach for the formation of diamond nanowires. In this paper, we highlight the influence of the doping level of the etched diamond substrate on the density of the resulting nanowires. Heavily boron-doped diamond interfaces result in very dense diamond nanowires, while etching of low boron-doped diamond substrates results in sparsely formed nanostructures, as boron dopant atoms in the diamond act as masks during the etching process. In pursuit of a better understanding of doping and plasma etching effects, we demonstrated by performing Raman imaging on single diamond nanowires that the etching process leads. to a dedoping of the wire tip and a partial transformation of diamond to sp(2) carbon. The etching process does not, however, alter the initial diamond feature of the rest-of the nanowire. Finally, the activity of the different diamond nanowires toward oxygen reduction in alkaline solution Was investigated. Interestingly, high boron-doped diamond nanowire interfaces reduce oxygen at a relatively lower potential of -0.3 V vs Ag/AgCl despite the boron dedoping at the tip of the wires. | Notes: | [Subramanian, Palaniappan; Kolagatla, Srikanth; Schechter, Alex] Ariel Univ, Dept Chem Sci, IL-40700 Ariel, Israel. [Szunerits, Sabine; Coffinier, Yannick; Boultherroub, Rabah] Univ Lille, Univ Valenciennes, CNRS, IEMN,ISEN,Cent Lille,UMR 8520, F-59000 Lille, France. [Yeap, Weng Siang; Haenen, Ken] Hasselt Univ, Inst Mat Res, IMO, Wetenschlapspk 1, B-3590 Diepenbeek, Belgium. [Yeap, Weng Siang; Haenen, Ken] IMEC Vzw, IMOMEC, Wetenschapspk 1, B-3590 Diepenbeek, Belgium. | Document URI: | http://hdl.handle.net/1942/24065 | ISSN: | 1932-7447 | e-ISSN: | 1932-7455 | DOI: | 10.1021/acs.jpcc.6b11546 | ISI #: | 000394482300026 | Rights: | © 2017 American Chemical Society | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2018 |
Appears in Collections: | Research publications |
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acs.jpcc.6b11546.pdf Restricted Access | Published version | 4.35 MB | Adobe PDF | View/Open Request a copy |
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