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http://hdl.handle.net/1942/2416
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DC Field | Value | Language |
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dc.contributor.author | Marson, S | - |
dc.contributor.author | Dorey, RA | - |
dc.contributor.author | Zhang, Q | - |
dc.contributor.author | Whatmore, RW | - |
dc.contributor.author | HARDY, An | - |
dc.contributor.author | MULLENS, Jules | - |
dc.date.accessioned | 2007-11-14T07:52:34Z | - |
dc.date.available | 2007-11-14T07:52:34Z | - |
dc.date.issued | 2004 | - |
dc.identifier.citation | JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 24(6). p. 1925-1928 | - |
dc.identifier.issn | 0955-2219 | - |
dc.identifier.uri | http://hdl.handle.net/1942/2416 | - |
dc.description.abstract | A highly concentrated solution for producing photopatternable layers of lead zirconate titanate (PZT) was prepared by dissolving into acrylic acid an amorphous PZT powder which was obtained by a sol-gel process. The solution was found to be suitable for spin-coating PZT layers that are photosensitive to UV radiation. After deposition and subsequent exposure the PZT film showed a decreased solubility in several organic compounds. These properties were exploited to create features on platinised silicon (Si) substrates. A thermogravimetric analysis was performed on the solution to determine the best thermal profile for the burn out of the organics. PZT features up to 2 mum thick were obtained after the firing process. (C) 2003 Elsevier Ltd. All rights reserved. | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.subject.other | drying; films; photopatterning; PZT; sol-gel process | - |
dc.title | Direct patterning of photosensitive chemical solution deposition PZT layers | - |
dc.type | Journal Contribution | - |
dc.identifier.epage | 1928 | - |
dc.identifier.issue | 6 | - |
dc.identifier.spage | 1925 | - |
dc.identifier.volume | 24 | - |
local.format.pages | 4 | - |
local.bibliographicCitation.jcat | A1 | - |
dc.description.notes | Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England. Limburgs Univ Ctr, Lab Inorgan & Phys Chem, Diepenbeek, Belgium.Dorey, RA, Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England.r.a.dorey@cranfield.ac.uk | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.bibliographicCitation.oldjcat | A1 | - |
dc.identifier.doi | 10.1016/S0955-2219(03)00543-0 | - |
dc.identifier.isi | 000189247800205 | - |
item.fulltext | No Fulltext | - |
item.contributor | Marson, S | - |
item.contributor | Dorey, RA | - |
item.contributor | Zhang, Q | - |
item.contributor | Whatmore, RW | - |
item.contributor | HARDY, An | - |
item.contributor | MULLENS, Jules | - |
item.fullcitation | Marson, S; Dorey, RA; Zhang, Q; Whatmore, RW; HARDY, An & MULLENS, Jules (2004) Direct patterning of photosensitive chemical solution deposition PZT layers. In: JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 24(6). p. 1925-1928. | - |
item.accessRights | Closed Access | - |
item.validation | ecoom 2005 | - |
crisitem.journal.issn | 0955-2219 | - |
crisitem.journal.eissn | 1873-619X | - |
Appears in Collections: | Research publications |
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