Please use this identifier to cite or link to this item:
http://hdl.handle.net/1942/2416
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Marson, S | - |
dc.contributor.author | Dorey, RA | - |
dc.contributor.author | Zhang, Q | - |
dc.contributor.author | Whatmore, RW | - |
dc.contributor.author | HARDY, An | - |
dc.contributor.author | MULLENS, Jules | - |
dc.date.accessioned | 2007-11-14T07:52:34Z | - |
dc.date.available | 2007-11-14T07:52:34Z | - |
dc.date.issued | 2004 | - |
dc.identifier.citation | JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 24(6). p. 1925-1928 | - |
dc.identifier.issn | 0955-2219 | - |
dc.identifier.uri | http://hdl.handle.net/1942/2416 | - |
dc.description.abstract | A highly concentrated solution for producing photopatternable layers of lead zirconate titanate (PZT) was prepared by dissolving into acrylic acid an amorphous PZT powder which was obtained by a sol-gel process. The solution was found to be suitable for spin-coating PZT layers that are photosensitive to UV radiation. After deposition and subsequent exposure the PZT film showed a decreased solubility in several organic compounds. These properties were exploited to create features on platinised silicon (Si) substrates. A thermogravimetric analysis was performed on the solution to determine the best thermal profile for the burn out of the organics. PZT features up to 2 mum thick were obtained after the firing process. (C) 2003 Elsevier Ltd. All rights reserved. | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.subject.other | drying; films; photopatterning; PZT; sol-gel process | - |
dc.title | Direct patterning of photosensitive chemical solution deposition PZT layers | - |
dc.type | Journal Contribution | - |
dc.identifier.epage | 1928 | - |
dc.identifier.issue | 6 | - |
dc.identifier.spage | 1925 | - |
dc.identifier.volume | 24 | - |
local.format.pages | 4 | - |
local.bibliographicCitation.jcat | A1 | - |
dc.description.notes | Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England. Limburgs Univ Ctr, Lab Inorgan & Phys Chem, Diepenbeek, Belgium.Dorey, RA, Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England.r.a.dorey@cranfield.ac.uk | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.bibliographicCitation.oldjcat | A1 | - |
dc.identifier.doi | 10.1016/S0955-2219(03)00543-0 | - |
dc.identifier.isi | 000189247800205 | - |
item.accessRights | Closed Access | - |
item.fullcitation | Marson, S; Dorey, RA; Zhang, Q; Whatmore, RW; HARDY, An & MULLENS, Jules (2004) Direct patterning of photosensitive chemical solution deposition PZT layers. In: JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 24(6). p. 1925-1928. | - |
item.contributor | Marson, S | - |
item.contributor | Dorey, RA | - |
item.contributor | Zhang, Q | - |
item.contributor | Whatmore, RW | - |
item.contributor | HARDY, An | - |
item.contributor | MULLENS, Jules | - |
item.fulltext | No Fulltext | - |
item.validation | ecoom 2005 | - |
crisitem.journal.issn | 0955-2219 | - |
crisitem.journal.eissn | 1873-619X | - |
Appears in Collections: | Research publications |
SCOPUSTM
Citations
6
checked on Sep 2, 2020
WEB OF SCIENCETM
Citations
5
checked on Apr 22, 2024
Page view(s)
72
checked on Jul 28, 2023
Google ScholarTM
Check
Altmetric
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.