Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/2449
Title: Chemical solution deposition of ZnO thin films by an aqueous solution gel precursor route
Authors: MONDELAERS, Dirk 
VANHOYLAND, Geert 
VAN DEN RUL, Heidi 
D'HAEN, Jan 
VAN BAEL, Marlies 
MULLENS, Jules 
VAN POUCKE, Lucien 
Issue Date: 2003
Publisher: KLUWER ACADEMIC PUBL
Source: JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 26(1-3). p. 523-526
Abstract: An aqueous chemical solution deposition method was used to prepare thin films of ZnO on SiO2/Si (1 1 1) substrates. Starting from an aqueous solution of Zn acetate, citric acid and ammonia, very thin films could be deposited by spin coating. Heating parameters, necessary for thin film annealing, were determined using FTIR experiments on dried gel precursors, heated up to different temperatures. The morphology and the thickness of the films were investigated by SEM. It is found that homogeneous thin films with grain sizes of about 20 nm are formed. XRD experiments show that there is an indication that the films, crystallized at 500degreesC, exhibit preferential grain growth along the c-axis.
Notes: Limburgs Univ Ctr, IMO, Lab Inorgan & Phys Chem, B-3590 Diepenbeek, Belgium. Limburgs Univ Ctr, IMO, Div Mat Phys, B-3590 Diepenbeek, Belgium.Mullens, J, Limburgs Univ Ctr, IMO, Lab Inorgan & Phys Chem, Univ Campus, B-3590 Diepenbeek, Belgium.
Keywords: ZnO; thin film; precursor chemistry; aqueous chemical solution deposition
Document URI: http://hdl.handle.net/1942/2449
ISSN: 0928-0707
e-ISSN: 1573-4846
DOI: 10.1023/A:1020703500515
ISI #: 000178789100093
Category: A1
Type: Journal Contribution
Validations: ecoom 2003
Appears in Collections:Research publications

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