Chemical solution deposition of ZnO thin films by an aqueous solution gel precursor route

Abstract

An aqueous chemical solution deposition method was used to prepare thin films of ZnO on SiO2/Si (1 1 1) substrates. Starting from an aqueous solution of Zn acetate, citric acid and ammonia, very thin films could be deposited by spin coating. Heating parameters, necessary for thin film annealing, were determined using FTIR experiments on dried gel precursors, heated up to different temperatures. The morphology and the thickness of the films were investigated by SEM. It is found that homogeneous thin films with grain sizes of about 20 nm are formed. XRD experiments show that there is an indication that the films, crystallized at 500degreesC, exhibit preferential grain growth along the c-axis.