Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/26236
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dc.contributor.authorRani, Revati-
dc.contributor.authorPanda, Kalpataru-
dc.contributor.authorKumar, Niranjan-
dc.contributor.authorKAMATCHI JOTHIRAMALINGAM, Sankaran-
dc.contributor.authorGanesa, K.-
dc.contributor.authorLin, I-Nan-
dc.date.accessioned2018-06-29T08:01:13Z-
dc.date.available2018-06-29T08:01:13Z-
dc.date.issued2018-
dc.identifier.citationJOURNAL OF PHYSICAL CHEMISTRY C, 122(15), p. 8602-8613-
dc.identifier.issn1932-7447-
dc.identifier.urihttp://hdl.handle.net/1942/26236-
dc.description.abstractTribological properties of diamond films are sensitive to the chemically reactive and inert tribo-atmospheric media, and therefore, it is difficult to understand the underlying tribological mechanisms. In the present work, tribological properties of surface modified ultrananocrystalline diamond (UNCD) thin films were investigated in four distinct tribo-environmental conditions of ambient humid-atmosphere, nitrogen (N-2), argon (Ar), and methane (CH4) gases. The in situ depth-resolved X-ray photoelectron spectroscopy (XPS) showed the desorption of oxygen and oxy-functional additives and sputtering of weakly bonded amorphous carbon species from the UNCD film surface after the Art-ion sputtering process. After desorption of these chemical entities, friction and wear were decreased and run-in regime cycles became shorter in UNCD films. Friction in the ambient humid-atmosphere was higher compared to other tribo-environmental conditions, and it was explained by the oxidation mechanism of the sliding interfaces and the formation of the oxidized carbon transferfilm. However, low friction and wear in the N-2 atmosphere was associated with the adsorption of N-2 species, forming nitrogen-terminated carbon bonds at the sliding interfaces. This was directly investigated by XPS and energy dispersive X-ray spectroscopy techniques. Furthermore, low friction in the Ar atmosphere was explained by the physical adsorption of Ar gaseous species, which tend to avoid the covalent carbon bond formation across the sliding interfaces. Moreover, ultralow friction in the CH4 atmosphere was governed by the passivation of dangling carbon bonds by dissociative CH4 complexes, which creates hydrogen-terminated repulsive sliding interfaces. More importantly, a shorter run-in regime with low friction and wear in Art-ion sputtered UNCD films were explained by desorption of the oxygen and oxy-functional groups, which are inherently present in the UNCD films.-
dc.description.sponsorshipK.J.S. is a postdoctoral fellow of the Research Foundation Flanders (FWO). K.P. acknowledges the Institute for Basic Science, S. Korea. R.R., N.K. and KG acknowledges the Department of Atomic Energy, India for support.-
dc.language.isoen-
dc.titleTribological Properties of Ultrananocrystalline Diamond Films in Inert and Reactive Tribo-Atmospheres: XPS Depth-Resolved Chemical Analysis-
dc.typeJournal Contribution-
dc.identifier.epage8613-
dc.identifier.issue15-
dc.identifier.spage8602-
dc.identifier.volume122-
local.bibliographicCitation.jcatA1-
dc.description.notesKumar, N (reprint author), Indira Gandhi Ctr Atom Res, HBNI, Mat Sci Grp, Kalpakkam 603102, Tamil Nadu, India niranjan@igcar.gov.in-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.identifier.doi10.1021/acs.jpcc.8b00856-
dc.identifier.isi000430896500063-
item.fulltextWith Fulltext-
item.validationecoom 2019-
item.contributorRani, Revati-
item.contributorLin, I-Nan-
item.contributorKumar, Niranjan-
item.contributorGanesa, K.-
item.contributorKAMATCHI JOTHIRAMALINGAM, Sankaran-
item.contributorPanda, Kalpataru-
item.fullcitationRani, Revati; Panda, Kalpataru; Kumar, Niranjan; KAMATCHI JOTHIRAMALINGAM, Sankaran; Ganesa, K. & Lin, I-Nan (2018) Tribological Properties of Ultrananocrystalline Diamond Films in Inert and Reactive Tribo-Atmospheres: XPS Depth-Resolved Chemical Analysis. In: JOURNAL OF PHYSICAL CHEMISTRY C, 122(15), p. 8602-8613.-
item.accessRightsRestricted Access-
crisitem.journal.issn1932-7447-
crisitem.journal.eissn1932-7455-
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