Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/27685
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dc.contributor.authorSAMYN, Pieter-
dc.contributor.authorBiesalski, Markus-
dc.contributor.authorPrucker, Oswald-
dc.contributor.authorRühe, Jürgen-
dc.date.accessioned2019-02-08T14:23:50Z-
dc.date.available2019-02-08T14:23:50Z-
dc.date.issued2019-
dc.identifier.citationJOURNAL OF APPLIED POLYMER SCIENCE, 136(5) (Art N° 47321)-
dc.identifier.issn0021-8995-
dc.identifier.urihttp://hdl.handle.net/1942/27685-
dc.description.abstractThe design of structured adhesive interfaces can be realized by dewetting of a liquid adhesive onto substrates with hydrophilic and hydrophobic domains followed by photochemical crosslinking. The latter allows the creation of well-defined arrays of confined adhesive pads with a controlled geometry. In a first step, the surfaces are covered by a hydrophobic film and lithographically patterned through a mask with an array of spots with diameter of 2 mm. The adhesive can consequently be locally deposited by a dosing syringe and remains confined within the hydrophilic spots. By defining the volume of the adhesive droplets, the contact angle and height of the adhesive pads are controlled through pinning at the hydrophilic/hydrophobic interface, which prevents further spreading. Alternatively, the dip coating and spontaneous dewetting of liquid adhesive over the patterned surface provide a continuous fabrication method for adhesive pad arrays. In a second step, the geometry of the deposited adhesive pads is stabilized by partial crosslinking during different times under UV light. Finally, an adhesive joint is created by applying the counterface followed by full cross-linking. The adhesive strength and mechanical performance are further optimized by considering different crosslinking times and pattern designs.-
dc.language.isoen-
dc.subject.otheradhesives; photopolymerization; surfaces and interface-
dc.titleDewetting and photochemical cross-linking of adhesive pads onto lithographically patterned surfaces-
dc.typeJournal Contribution-
dc.identifier.issue5-
dc.identifier.volume136-
local.bibliographicCitation.jcatA1-
dc.description.notes[Samyn, Pieter] Hasselt Univ, Inst Mat Res Appl & Analyt Chem, Agoralaan Gebouw D, B-3590 Diepenbeek, Belgium. [Biesalski, Markus] Tech Univ Darmstadt, Macromol Chem & Paper Chem, Ernst Berl Inst Tech & Macromol Chem, Darmstadt, Germany. [Prucker, Oswald; Ruehe, Juergen] Univ Freiburg, Inst Microsyst Technol IMTEK, Lab Chem & Phys Interfaces, Freiburg, Germany.-
local.type.refereedRefereed-
local.type.specifiedArticle-
local.bibliographicCitation.artnr47321-
dc.identifier.doi10.1002/app.47321-
dc.identifier.isi000458323000008-
item.fullcitationSAMYN, Pieter; Biesalski, Markus; Prucker, Oswald & Rühe, Jürgen (2019) Dewetting and photochemical cross-linking of adhesive pads onto lithographically patterned surfaces. In: JOURNAL OF APPLIED POLYMER SCIENCE, 136(5) (Art N° 47321).-
item.accessRightsRestricted Access-
item.contributorSAMYN, Pieter-
item.contributorBiesalski, Markus-
item.contributorPrucker, Oswald-
item.contributorRühe, Jürgen-
item.fulltextWith Fulltext-
item.validationecoom 2020-
crisitem.journal.issn0021-8995-
crisitem.journal.eissn1097-4628-
Appears in Collections:Research publications
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