In-situ SEM observation of electromigration in thin metal films at accelerated stress conditions

Abstract

With so-called in-situ SEM experiments, electromigration experiments are performed in a SEM (scanning electron microscope) equipped with a heating stage. BSE (back scattered electron) images are taken continuously over the entire length of a metal line submitted to high current and temperature stress, monitoring in detail the microstructure. Comparing the electrical resistance curves with the corresponding SEM micrographs and with ex-situ AFM measurements leads to detailed qualitative and quantitative information about the occurring electromigration and precipitation / dissolution effects in the metal lines. (C) 2000 Elsevier Science Ltd. All rights reserved.