Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/28725
Title: Low Temperature Synthesis of Lithium-Doped Nanocrystalline Diamond Films with Enhanced Field Electron Emission Properties
Authors: KAMATCHI JOTHIRAMALINGAM, Sankaran 
Panda, Kalpataru
Hsieh, Ping-Yen
POBEDINSKAS, Paulius 
Park, Jeong Young
VAN BAEL, Marlies 
Tai, Nyan-Hwa
Lin, I-Nan
HAENEN, Ken 
Issue Date: 2018
Publisher: MDPI
Source: NANOMATERIALS, 8(9) (Art N° 653)
Abstract: Low temperature (350 degrees C) grown conductive nanocrystalline diamond (NCD) films were realized by lithium diffusion from Cr-coated lithium niobate substrates (Cr /LNO). The NCD/Cr/LNO films showed a low resistivity of 0.01 Omega.cm and excellent field electron emission characteristics, viz. a low turn-on field of 2.3 V/mu m, a high-current density of 11.0 mA/cm(2) (at 4.9 V/m), a large field enhancement factor of 1670, and a life-time stability of 445 min (at 3.0 mA/cm(2)). The low temperature deposition process combined with the excellent electrical characteristics offers a new prospective for applications based on temperature sensitive materials.
Notes: [Sankaran, Kamatchi Jothiramalingam; Pobedinskas, Paulius; Van Bael, Marlies K.; Haenen, Ken] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Sankaran, Kamatchi Jothiramalingam; Pobedinskas, Paulius; Van Bael, Marlies K.; Haenen, Ken] IMEC Vzw, IMOMEC, B-3590 Diepenbeek, Belgium. [Panda, Kalpataru; Park, Jeong Young] Inst for Basic Sci Korea, Ctr Nanomat & Chem React, Daejeon 34141, South Korea. [Hsieh, Ping-Yen; Tai, Nyan-Hwa] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan. [Park, Jeong Young] Korea Adv Inst Sci & Technol, Grad Sch EEWS, Daejeon 34141, South Korea. [Lin, I-Nan] Tamkang Univ, Dept Phys, Tamsui 251, Taiwan.
Keywords: nanocrystalline diamond; lithium; low temperature; field electron emission;nanocrystalline diamond; lithium; low temperature; field electron emission
Document URI: http://hdl.handle.net/1942/28725
e-ISSN: 2079-4991
DOI: 10.3390/nano8090653
ISI #: 000448659200021
Rights: © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
Category: A1
Type: Journal Contribution
Validations: ecoom 2019
Appears in Collections:Research publications

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