Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/28969
Title: Nitrogen Incorporated (Ultra)Nanocrystalline Diamond Films for Field Electron Emission Applications
Authors: KAMATCHI JOTHIRAMALINGAM, Sankaran 
HAENEN, Ken 
Issue Date: 2019
Publisher: SPRINGER INTERNATIONAL PUBLISHING AG
Source: Nianjun Yang (Ed.). Novel Aspects of Diamond – From Growth to Applications, Springer Nature, p. 123-171
Series/Report: Topics in Applied Physics
Series/Report no.: 121
Abstract: Diamond is eminent to own a series of outstanding physical and chemical properties, thus rendering it to be a strong cold cathode material for field electron emission (FEE) applications. FEE from diamond materials comprises the supply of electrons to the conduction band of the materials, transport through bulk, and lastly emission at the surface. In this chapter, the enhancement in the FEE characteristics of nitrogen incorporated (ultra)nanocrystalline diamond ((U)NCD) films and their related nanostructures is discussed. Ion implantation, in-situ impurity doping in plasma, and post plasma treatment processes have been employed to incorporate nitrogen in (U)NCD. The possible mechanism through which the change in microstructure enhances the FEE characteristics of nitrogen incorporated (U)NCD films/nanostructures is discussed.
Keywords: Diamond films;Nitrogen incorporation;Field electron emission;Microstructure;Plasma illumination
Document URI: http://hdl.handle.net/1942/28969
ISBN: 9783030124687
DOI: 10.1007/978-3-030-12469-4_5
ISI #: WOS:000554829300007
Rights: 2020 Springer Nature Switzerland AG. Part of Springer Nature.
Category: B2
Type: Book Section
Appears in Collections:Research publications

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