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http://hdl.handle.net/1942/28969
Title: | Nitrogen Incorporated (Ultra)Nanocrystalline Diamond Films for Field Electron Emission Applications | Authors: | KAMATCHI JOTHIRAMALINGAM, Sankaran HAENEN, Ken |
Issue Date: | 2019 | Publisher: | SPRINGER INTERNATIONAL PUBLISHING AG | Source: | Nianjun Yang (Ed.). Novel Aspects of Diamond – From Growth to Applications, Springer Nature, p. 123-171 | Series/Report: | Topics in Applied Physics | Series/Report no.: | 121 | Abstract: | Diamond is eminent to own a series of outstanding physical and chemical properties, thus rendering it to be a strong cold cathode material for field electron emission (FEE) applications. FEE from diamond materials comprises the supply of electrons to the conduction band of the materials, transport through bulk, and lastly emission at the surface. In this chapter, the enhancement in the FEE characteristics of nitrogen incorporated (ultra)nanocrystalline diamond ((U)NCD) films and their related nanostructures is discussed. Ion implantation, in-situ impurity doping in plasma, and post plasma treatment processes have been employed to incorporate nitrogen in (U)NCD. The possible mechanism through which the change in microstructure enhances the FEE characteristics of nitrogen incorporated (U)NCD films/nanostructures is discussed. | Keywords: | Diamond films;Nitrogen incorporation;Field electron emission;Microstructure;Plasma illumination | Document URI: | http://hdl.handle.net/1942/28969 | ISBN: | 9783030124687 | DOI: | 10.1007/978-3-030-12469-4_5 | ISI #: | WOS:000554829300007 | Rights: | 2020 Springer Nature Switzerland AG. Part of Springer Nature. | Category: | B2 | Type: | Book Section |
Appears in Collections: | Research publications |
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317809_2_En_5_Chapter_Author.pdf Restricted Access | Non Peer-reviewed author version | 2.06 MB | Adobe PDF | View/Open Request a copy |
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