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|Title:||The preparation, characterization and tribological properties of TA-C : H deposited using an electron cyclotron wave resonance plasma beam source||Authors:||Morrison, NA
|Issue Date:||1999||Publisher:||WILEY-V C H VERLAG GMBH||Source:||PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 172(1). p. 79-90||Abstract:||A compact electron cyclotron wave resonance (ECWR) source has been developed for the high rate deposition of hydrogenated tetrahedral amorphous carbon (ta-C:H). The ECWR provides growth rates of up to 900 Angstrom/min over a 4 " diameter acid an independent control of the deposition rate and ion energy. The ta-C:H was deposited using acetylene as the source gas and was characterized in terms of its sp(3) content, mass density, intrinsic stress, hydrogen content, C-H bonding, Raman spectra, optical gap, surface roughness and friction coefficient. The results obtained indicated that the;film properties were maximized at an ion energy of approximately 167 eV, corresponding to an energy per daughter carbon ion of 76 eV. The relationship between the incident ion energy and film densification was also explained in terms of the subsurface implantation of carbon ions into the growing film.||Notes:||Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England. Univ Nacl Autonoma Mexico, Inst Invest Mat, Coyoacan, Mexico. Limburgs Univ Centrum, Inst Mat Res, B-3590 Diepenbeek, Belgium.Morrison, NA, Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England.email@example.com||Document URI:||http://hdl.handle.net/1942/3065||DOI:||10.1002/(SICI)1521-396X(199903)172:1<79::AID-PSSA79>3.0.CO;2-C||ISI #:||000079517400009||Type:||Journal Contribution||Validations:||ecoom 2000|
|Appears in Collections:||Research publications|
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