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http://hdl.handle.net/1942/3130
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DC Field | Value | Language |
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dc.contributor.author | Witvrouw, A | - |
dc.contributor.author | Proost, J | - |
dc.contributor.author | Roussel, P | - |
dc.contributor.author | COSEMANS, Patrick Peter | - |
dc.contributor.author | Maex, K | - |
dc.date.accessioned | 2007-11-26T15:39:24Z | - |
dc.date.available | 2007-11-26T15:39:24Z | - |
dc.date.issued | 1999 | - |
dc.identifier.citation | JOURNAL OF MATERIALS RESEARCH, 14(4). p. 1246-1254 | - |
dc.identifier.issn | 0884-2914 | - |
dc.identifier.uri | http://hdl.handle.net/1942/3130 | - |
dc.description.abstract | Substrate curvature measurements were used to study stress changes during thermal cycling and isothermal tensile stress relaxation in 800 nm Al-0,5 wt% Cu and Al-l wt% Si-0.5 wt% Cu films. For both compositions dislocation glide can describe the relaxation data well for temperatures up to 120 degrees C for Al-Si-Cu and up to 100 degrees C for Al-Cu. The average activation energy for Al-Si-Cu and Al-Cu is 1.7 +/- 0.2 eV and 3.0 +/- 0.3 eV, respectively. The athermal flow stress is the same for both and equal to 600 +/- 200 MPa. This result is consistent with the obstacles for glide being Al2Cu precipitates, which, in the case of Al-Si-Cu, are fine and can be cut by the dislocations, and, in the case of Al-Cu, are strong and provide Orowan strengthening. Also, the stress changes during thermal cycling in the Al-Cu films are different from these in the Al-Si-Cu films. For Al-Cu films, the room temperature stress decreases after each thermal cycle, while for Al-Si-Cu stress changes during thermal cycling are stable from the second cycle on. These observations are supported by thorough transmission electron microscopy (TEM) studies. | - |
dc.language.iso | en | - |
dc.publisher | MATERIALS RESEARCH SOCIETY | - |
dc.title | Stress relaxation in Al-Cu and Al-Si-Cu thin films | - |
dc.type | Journal Contribution | - |
dc.identifier.epage | 1254 | - |
dc.identifier.issue | 4 | - |
dc.identifier.spage | 1246 | - |
dc.identifier.volume | 14 | - |
local.format.pages | 9 | - |
dc.description.notes | IMEC, B-3001 Louvain, Belgium. Limburgs Univ Ctr, Div Mat Phys, B-3590 Diepenbeek, Belgium.Witvrouw, A, IMEC, Kapeldreef 75, B-3001 Louvain, Belgium. | - |
local.type.refereed | Refereed | - |
local.type.specified | Article | - |
dc.bibliographicCitation.oldjcat | A1 | - |
dc.identifier.isi | 000082550400016 | - |
item.fulltext | No Fulltext | - |
item.contributor | Witvrouw, A | - |
item.contributor | Proost, J | - |
item.contributor | Roussel, P | - |
item.contributor | COSEMANS, Patrick Peter | - |
item.contributor | Maex, K | - |
item.accessRights | Closed Access | - |
item.fullcitation | Witvrouw, A; Proost, J; Roussel, P; COSEMANS, Patrick Peter & Maex, K (1999) Stress relaxation in Al-Cu and Al-Si-Cu thin films. In: JOURNAL OF MATERIALS RESEARCH, 14(4). p. 1246-1254. | - |
item.validation | ecoom 2000 | - |
Appears in Collections: | Research publications |
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