Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/31503
Title: Introduction of Si PERC Rear Contacting Design to Boost Efficiency of Cu(In,Ga)Se-2 Solar Cells
Authors: VERMANG, Bart 
Watjen, JT
Frisk, C
Fjallstrom, V
Rostvall, F
Edoff, M
Salome, P
Borme, J
Nicoara, N
Sadewasser, S
Issue Date: 2014
Publisher: IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Source: IEEE Journal of Photovoltaics, 4 (6) , p. 1644 -1649
Abstract: Recently, Cu(In,Ga)Se-2 (CIGS) solar cells have achieved 21% world-record efficiency, partly due to the introduction of a postdeposition potassium treatment to improve the front interface of CIGS absorber layers. However, as high-efficiency CIGS solar cells essentially require long diffusion lengths, the highly recombinative rear of these devices also deserves attention. In this paper, an Al2O3 rear surface passivation layer with nanosized local point contacts is studied to reduce recombination at the standard Mo/CIGS rear interface. First, passivation layers with well-controlled grids of nanosized point openings are established by use of electron beam lithography. Next, rear-passivated CIGS solar cells with 240-nm-thick absorber layers are fabricated as study devices. These cells show an increase in open-circuit voltage (+57 mV), short-circuit current (+3.8 mA/cm(2)), and fill factor [9.5% (abs.)], compared with corresponding unpassivated reference cells, mainly due to improvements in rear surface passivation and rear internal reflection. Finally, solar cell capacitance simulator (SCAPS) modeling is used to calculate the effect of reduced back contact recombination on high-efficiency solar cells with standard absorber layer thickness. The modeling shows that up to 50-mV increase in open-circuit voltage is anticipated.
Keywords: Al2O3;Cu(In,Ga)Se-2;electron beam lithography;local point contacts;nanosized openings;passivation layer;passivated emitter and rear cell (PERC);rear internal reflection;rear surface recombination velocity;Si
Document URI: http://hdl.handle.net/1942/31503
ISSN: 2156-3381
e-ISSN: 2156-3403
DOI: 10.1109/jphotov.2014.2350696
ISI #: WOS:000344542900049
Category: A1
Type: Journal Contribution
Appears in Collections:Research publications

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