Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/31506
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dc.contributor.authorVERMANG, Bart-
dc.contributor.authorWerner, F.-
dc.contributor.authorStals, W.-
dc.contributor.authorLorenz-
dc.contributor.authorRothschild, A.-
dc.contributor.authorJohn, J.-
dc.contributor.authorPOORTMANS, Jef-
dc.contributor.authorMertens, R.-
dc.contributor.authorGortzen, R.-
dc.contributor.authorPoodt, P.-
dc.contributor.authorRoozeboom, F.-
dc.contributor.authorSchmidt, J.-
dc.date.accessioned2020-07-31T09:39:01Z-
dc.date.available2020-07-31T09:39:01Z-
dc.date.issued2011-
dc.date.submitted2020-07-30T08:55:39Z-
dc.identifier.citationp. 001144 -001149-
dc.identifier.isbn978-1-4244-9965-6-
dc.identifier.isbn978-1-4244-9966-3-
dc.identifier.isbn978-1-4244-9964-9-
dc.identifier.issn0160-8371-
dc.identifier.urihttp://hdl.handle.net/1942/31506-
dc.language.isoen-
dc.titleSpatially-separated atomic layer deposition of Al<inf>2</inf>O<inf>3</inf>, a new option for high-throughput si solar cell passivation-
dc.typeProceedings Paper-
local.bibliographicCitation.conferencedate19-24 June 2011-
local.bibliographicCitation.conferencenamePhotovoltaic Specialists, IEEE Conference 2011, 37th-
local.bibliographicCitation.conferenceplaceSeattle, WA, USA-
dc.identifier.epage001149-
dc.identifier.spage001144-
local.bibliographicCitation.jcatC1-
local.type.refereedRefereed-
local.type.specifiedProceedings Paper-
local.relation.ispartofseriesnr37-
dc.identifier.doi10.1109/pvsc.2011.6186155-
local.provider.typeCrossRef-
local.uhasselt.uhpubno-
item.fulltextNo Fulltext-
item.contributorVERMANG, Bart-
item.contributorWerner, F.-
item.contributorStals, W.-
item.contributorLorenz-
item.contributorRothschild, A.-
item.contributorJohn, J.-
item.contributorPOORTMANS, Jef-
item.contributorMertens, R.-
item.contributorGortzen, R.-
item.contributorPoodt, P.-
item.contributorRoozeboom, F.-
item.contributorSchmidt, J.-
item.fullcitationVERMANG, Bart; Werner, F.; Stals, W.; Lorenz; Rothschild, A.; John, J.; POORTMANS, Jef; Mertens, R.; Gortzen, R.; Poodt, P.; Roozeboom, F. & Schmidt, J. (2011) Spatially-separated atomic layer deposition of Al<inf>2</inf>O<inf>3</inf>, a new option for high-throughput si solar cell passivation. In: p. 001144 -001149.-
item.accessRightsClosed Access-
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