Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/31510
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dc.contributor.authorVERMANG, Bart-
dc.contributor.authorGoverde, H-
dc.contributor.authorUruena, A-
dc.contributor.authorLorenz-
dc.contributor.authorCornagliotti, E-
dc.contributor.authorRothschild, A-
dc.contributor.authorJohn, J-
dc.contributor.authorPOORTMANS, Jef-
dc.contributor.authorMertens, R-
dc.date.accessioned2020-07-31T09:58:06Z-
dc.date.available2020-07-31T09:58:06Z-
dc.date.issued2012-
dc.date.submitted2020-07-30T06:58:49Z-
dc.identifier.citationSolar energy materials and solar cells, 101 , p. 204 -209-
dc.identifier.urihttp://hdl.handle.net/1942/31510-
dc.description.abstractRandom Al back surface field (BSF) p-type Si solar cells are presented, where a stack of Al2O3 and SiNx is used as rear surface passivation layer containing blisters. It is shown that no additional contact opening step is needed, since during co-firing local Al BSFs are induced at the location of these blisters. The best fill factors and short circuit currents are obtained in the case of (i) a hydrophobic pre-passivation cleaning, since it leads to a small density of larger blisters, and (ii) 10 nm of Al2O3, where the blistering size still increases during firing thanks to additional out-gassing. There is an apparent gain in J(SC) and V-OC of, respectively, 1.3 mA/cm(2) and 5 mV for the best random Al BSF cells compared to full Al BSF reference cells, because of better rear internal reflection and rear surface passivation. (C) 2012 Elsevier B.V. All rights reserved.-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.rights2012 Elsevier B.V. All rights reserved.-
dc.subject.otherSi-
dc.subject.otherPERC-
dc.subject.otherLocal Al BSF-
dc.subject.otherSurface passivation-
dc.subject.otherAtomic layer deposition-
dc.subject.otherAl2O3-
dc.titleBlistering in ALD Al2O3 passivation layers as rear contacting for local Al BSF Si solar cells-
dc.typeJournal Contribution-
dc.identifier.epage209-
dc.identifier.spage204-
dc.identifier.volume101-
local.bibliographicCitation.jcatA1-
local.publisher.placePO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.identifier.doi10.1016/j.solmat.2012.01.032-
dc.identifier.isiWOS:000303957000034-
dc.identifier.eissn-
local.provider.typeWeb of Science-
local.uhasselt.uhpubyes-
item.fulltextWith Fulltext-
item.fullcitationVERMANG, Bart; Goverde, H; Uruena, A; Lorenz; Cornagliotti, E; Rothschild, A; John, J; POORTMANS, Jef & Mertens, R (2012) Blistering in ALD Al2O3 passivation layers as rear contacting for local Al BSF Si solar cells. In: Solar energy materials and solar cells, 101 , p. 204 -209.-
item.accessRightsRestricted Access-
item.contributorVERMANG, Bart-
item.contributorGoverde, H-
item.contributorUruena, A-
item.contributorLorenz-
item.contributorCornagliotti, E-
item.contributorRothschild, A-
item.contributorJohn, J-
item.contributorPOORTMANS, Jef-
item.contributorMertens, R-
crisitem.journal.issn0927-0248-
crisitem.journal.eissn1879-3398-
Appears in Collections:Research publications
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