Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/3241
Title: W/WC diffusion barrier layers for CVD diamond coatings deposited on WC-Co: microstructure and properties
Authors: Kadlec, S
VANDIERENDONCK, Kristine 
Van Stappen, M
NESLADEK, Milos 
QUAEYHAEGENS, Carl 
STALS, Lambert 
Issue Date: 1998
Publisher: ELSEVIER SCIENCE SA
Source: SURFACE & COATINGS TECHNOLOGY, 98(1-3). p. 1060-1065
Abstract: WC films are investigated for use as intermediate layers for adhesion improvement between the cemented carbide (WC-Co) substrate and a CVD diamond wear resistant layer. WC layers are prepared by reactive magnetron sputtering. Deposition conditions during the sputtering are adjusted to change the WC layer stoichiometry and the microstructure. Layers are investigated by X-ray diffraction and scanning electron microscopy (SEM) in as deposited and in annealed states. Adhesion of diamond is investigated by Rockwell-C indentation. Adhesion data shows a strong dependency on the deposition conditions for the WC layers. This data is explained in terms of Co diffusion from the substrate through the intermediate layer and of mechanical properties of the intermediate layer itself. (C) 1998 Published by Elsevier Science S.A.
Notes: Sci & Tech Ctr Metalworking Ind, WTCM, Wetenschapspk, B-3590 Diepenbeek, Belgium. Limburgs Univ Ctr, Inst Mat Res, Div Mat Phys, B-3590 Diepenbeek, Belgium.Kadlec, S, Acad Sci Czech Republ, Inst Phys, Na Slovance 2, CZ-18040 Prague 8, Czech Republic.
Keywords: diffusion barriers; CVD; diamond coatings
Document URI: http://hdl.handle.net/1942/3241
DOI: 10.1016/S0257-8972(97)00553-7
ISI #: 000072647200044
Type: Journal Contribution
Validations: ecoom 1999
Appears in Collections:Research publications

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