Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/32458
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dc.contributor.authorREENAERS, Dieter-
dc.contributor.authorMARCHAL, Wouter-
dc.contributor.authorBiesmans, Ianto-
dc.contributor.authorNIVELLE, Philippe-
dc.contributor.authorD'HAEN, Jan-
dc.contributor.authorDEFERME, Wim-
dc.date.accessioned2020-10-13T13:02:55Z-
dc.date.available2020-10-13T13:02:55Z-
dc.date.issued2020-
dc.date.submitted2020-09-02T09:51:10Z-
dc.identifier.citationNANOMATERIALS, 10 (5) (Art N° 892)-
dc.identifier.urihttp://hdl.handle.net/1942/32458-
dc.description.abstractThe field of printed electronics is rapidly evolving, producing low cost applications with enhanced performances with transparent, stretchable properties and higher reliability. Due to the versatility of printed electronics, industry can consider the implementation of electronics in a way which was never possible before. However, a post-processing step to achieve conductive structures-known as sintering-limits the production ease and speed of printed electronics. This study addresses the issues related to fast sintering without scarifying important properties such as conductivity and surface roughness. A drop-on-demand inkjet printer is employed to deposit silver nanoparticle-based inks. The post-processing time of these inks is reduced by replacing the conventional oven sintering procedure with the state-of-the-art method, named near-infrared sintering. By doing so, the post-processing time shortens from 30-60 min to 6-8 s. Furthermore, the maximum substrate temperature during sintering is reduced from 200 degrees C to 120 degrees C. Based on the results of this study, one can conclude that near-infrared sintering is a ready-to-industrialize post-processing method for the production of printed electronics, capable of sintering inks at high speed, low temperature and with low complexity. Furthermore, it becomes clear that ink optimization plays an important role in processing inkjet printable inks, especially after being near-infrared sintered.-
dc.language.isoen-
dc.publisherMDPI-
dc.rights© 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).-
dc.subject.othernear-infrared-
dc.subject.otherphotonic sintering-
dc.subject.othersilver-
dc.subject.othernano particle-
dc.subject.otherinkjet-
dc.subject.otherprinting-
dc.subject.otherlight absorption-
dc.titleLayer Morphology and Ink Compatibility of Silver Nanoparticle Inkjet Inks for Near-Infrared Sintering-
dc.typeJournal Contribution-
dc.identifier.issue5-
dc.identifier.volume10-
local.format.pages14-
local.bibliographicCitation.jcatA1-
dc.description.notesDeferme, W (corresponding author), Univ Hasselt, Inst Mat Res IMO, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.; Deferme, W (corresponding author), IMEC VZW, Div IMOMEC, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.-
dc.description.notesdieter.reenaers@uhasselt.be; Wouter.Marchal@uhasselt.be;-
dc.description.notesIanto.biesmans@uhasselt.be; philippe.nivelle@uhasselt.be;-
dc.description.notesJan.Dhaen@uhasselt.be; Wim.Deferme@uhasselt.be-
dc.description.otherDeferme, W (corresponding author), Univ Hasselt, Inst Mat Res IMO, Wetenschapspk 1, B-3590 Diepenbeek, Belgium; IMEC VZW, Div IMOMEC, Wetenschapspk 1, B-3590 Diepenbeek, Belgium. dieter.reenaers@uhasselt.be; Wouter.Marchal@uhasselt.be; Ianto.biesmans@uhasselt.be; philippe.nivelle@uhasselt.be; Jan.Dhaen@uhasselt.be; Wim.Deferme@uhasselt.be-
local.publisher.placeST ALBAN-ANLAGE 66, CH-4052 BASEL, SWITZERLAND-
local.type.refereedRefereed-
local.type.specifiedArticle-
local.bibliographicCitation.artnr892-
dc.identifier.doi10.3390/nano10050892-
dc.identifier.pmid32392730-
dc.identifier.isiWOS:000540781800075-
dc.contributor.orcidDeferme, Wim/0000-0002-8982-959X-
local.provider.typewosris-
local.uhasselt.uhpubyes-
local.description.affiliation[Reenaers, Dieter; Marchal, Wouter; Biesmans, Ianto; Nivelle, Philippe; D'Haen, Jan; Deferme, Wim] Univ Hasselt, Inst Mat Res IMO, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.-
local.description.affiliation[Reenaers, Dieter; Marchal, Wouter; Nivelle, Philippe; D'Haen, Jan; Deferme, Wim] IMEC VZW, Div IMOMEC, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.-
item.fullcitationREENAERS, Dieter; MARCHAL, Wouter; Biesmans, Ianto; NIVELLE, Philippe; D'HAEN, Jan & DEFERME, Wim (2020) Layer Morphology and Ink Compatibility of Silver Nanoparticle Inkjet Inks for Near-Infrared Sintering. In: NANOMATERIALS, 10 (5) (Art N° 892).-
item.fulltextWith Fulltext-
item.validationecoom 2021-
item.contributorREENAERS, Dieter-
item.contributorMARCHAL, Wouter-
item.contributorBiesmans, Ianto-
item.contributorNIVELLE, Philippe-
item.contributorD'HAEN, Jan-
item.contributorDEFERME, Wim-
item.accessRightsOpen Access-
crisitem.journal.eissn2079-4991-
Appears in Collections:Research publications
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