Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/3287
Title: Study of the delamination of diamond coatings under thermal stress
Authors: KNUYT, Gilbert 
VANDIERENDONCK, Kristine 
QUAEYHAEGENS, Carl 
Van Stappen, M
STALS, Lambert 
Issue Date: 1997
Publisher: ELSEVIER SCIENCE SA LAUSANNE
Source: THIN SOLID FILMS, 300(1-2). p. 189-196
Abstract: The influence of the thickness of CVD diamond coatings on the adhesion to a substrate, after cooling down from deposition temperature to room temperature, has been studied experimentally and theoretically. Diamond layers have been deposited at 850 degrees C on W substrates by microwave plasma enhanced CVD. Cooling down of the substrate-diamond coating system to room temperature induces thermal stresses, due to different thermal expansion coefficients of coating and substrate. For thick diamond coatings a total and sudden delamination could be observed as a consequence of these stresses. On the contrary thin coatings, produced under identical circumstances, adhered well. These phenomena have been modelled and explained by the use of an energetic criterion for the delamination of a two-layer system under thermal stress. From the model a critical thickness of the coating can be calculated. Above this critical thickness, delamination will suddenly occur. The calculations also predict that for intermediate coating thicknesses delamination can easily be induced by external causes. (C) 1997 Elsevier Science S.A.
Notes: WTCM,SCI & TECH CTR METALWORKING IND,B-3590 DIEPENBEEK,BELGIUM.Knuyt, G, LIMBURGS UNIV CTR,INST MAT RES,WETENSCHAPSPK,B-3590 DIEPENBEEK,BELGIUM.
Keywords: adhesion; chemical vapour deposition (CVD); coatings; diamond
Document URI: http://hdl.handle.net/1942/3287
DOI: 10.1016/S0040-6090(96)09497-7
ISI #: A1997XH76300028
Type: Journal Contribution
Appears in Collections:Research publications

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