Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/3311
Title: Optical emission spectroscopy of the plasma during microwave CVD of diamond thin films with nitrogen addition and relation to the thin film morphology
Authors: Vandevelde, Thierry
NESLADEK, Milos 
QUAEYHAEGENS, Carl 
STALS, Lambert 
Issue Date: 1997
Publisher: ELSEVIER SCIENCE SA
Source: THIN SOLID FILMS, 308-309. p. 154-158
Abstract: It is common knowledge that the presence of gas impurities such as nitrogen during microwave plasma assisted chemical vapour deposition of diamond can drastically affect the film morphology and even favour the growth of oriented textured films. it was shown previously that diamond films could be grown with various preferred orientations depending on the fraction of nitrogen present in the process gas mixture. In this work, we show how the methane and nitrogen fractions in the feed gas can alter the morphology of the diamond film deposited at high substrate temperature (1600 K). The domain of high substrate temperatures (>1300 K) has not yet been widely investigated and offers the opportunity of growing diamond films with other textures and morphologies with respect to their counterparts grown at lower temperatures. Optical emission spectroscopy is applied to study the spatial distribution of atomic hydrogen, CN and Ca emitting radicals from the substrate surface to the bulk plasma. Scanning electron microscopy and X-ray diffraction are used, respectively, to identify the different diamond film morphologies and to establish the preferred growth orientations ranging from {111} to {100} textured films. (C) 1997 Elsevier Science S.A.
Notes: Limburgs Univ Ctr, Inst Mat Res, B-3590 Diepenbeek, Belgium.Vandevelde, T, Limburgs Univ Ctr, Inst Mat Res, Univ Campus,Westenschapspk 1, B-3590 Diepenbeek, Belgium.
Keywords: optical emission spectroscopy; chemical vapour deposition; thin films
Document URI: http://hdl.handle.net/1942/3311
ISSN: 0040-6090
e-ISSN: 1879-2731
DOI: 10.1016/S0040-6090(97)00408-2
ISI #: 000071553400028
Type: Journal Contribution
Validations: ecoom 1999
Appears in Collections:Research publications

Show full item record

SCOPUSTM   
Citations

31
checked on Sep 3, 2020

WEB OF SCIENCETM
Citations

28
checked on May 14, 2022

Page view(s)

44
checked on May 15, 2022

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.