Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/3480
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dc.contributor.authorQUAEYHAEGENS, Carl-
dc.contributor.authorKerkhofs, M-
dc.contributor.authorSTALS, Lambert-
dc.contributor.authorVan Stappen, M-
dc.date.accessioned2007-11-28T15:08:25Z-
dc.date.available2007-11-28T15:08:25Z-
dc.date.issued1996-
dc.identifier.citationSURFACE & COATINGS TECHNOLOGY, 80(1-2). p. 181-184-
dc.identifier.issn0257-8972-
dc.identifier.urihttp://hdl.handle.net/1942/3480-
dc.description.abstractPhysical vapour deposited (PVD) coatings are used for a variety of industrial applications. Recent developments, such as duplex treatment, TiN deposited at low temperatures and Ti2N coatings, are still under investigation and their field of application is not yet fully known. This paper describes the deposition, properties and applications for each of these coating systems.-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA LAUSANNE-
dc.subject.otherduplex treatment; low temperature PVD; PVD; Ti2N-
dc.titlePromising developments for new applications-
dc.typeJournal Contribution-
dc.identifier.epage184-
dc.identifier.issue1-2-
dc.identifier.spage181-
dc.identifier.volume80-
local.format.pages4-
dc.description.notesQuaeyhaegens, C, WTCM,SCI TECH CTR METALWORKING IND,B-3590 DIEPENBEEK,BELGIUM.-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.bibliographicCitation.oldjcatA1-
dc.identifier.doi10.1016/0257-8972(95)02707-6-
dc.identifier.isiA1996UE93300033-
item.fullcitationQUAEYHAEGENS, Carl; Kerkhofs, M; STALS, Lambert & Van Stappen, M (1996) Promising developments for new applications. In: SURFACE & COATINGS TECHNOLOGY, 80(1-2). p. 181-184.-
item.fulltextNo Fulltext-
item.contributorQUAEYHAEGENS, Carl-
item.contributorKerkhofs, M-
item.contributorSTALS, Lambert-
item.contributorVan Stappen, M-
item.accessRightsClosed Access-
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