Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/35905
Title: A multi-stack Al2O3/HfO2 design with contact openings for front surface of Cu(In,Ga)Se2 solar cells
Authors: BULDU KOHL, Dilara 
DE WILD, Jessica 
KOHL, Thierry 
BIRANT, Gizem 
BRAMMERTZ, Guy 
MEURIS, Marc 
POORTMANS, Jef 
VERMANG, Bart 
Issue Date: 2021
Publisher: IEEE
Source: IEEE, p. 1176 -1178
Abstract: A new multi-stack approach with contact openings was investigated for front surface of Cu(In,Ga)Se-2 thin film solar cells. In this multi-stack design, a thin HfOx layer was used to protect a thicker AlOx layer from the presence of ammonia in the chemical bath deposition. The contact openings were created by using alkali solution. The lifetime decay was improved by implementing multi-stack passivation layer between CIGS/buffer layer interface. It was shown that open circuit voltage was increased by up to 30mV.
Notes: Buldu, DG (corresponding author), Hasselt Univ Partner Solliance, Inst Mat Res IMO, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.; Buldu, DG (corresponding author), Imec Div IMOMEC Partner Solliance, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.; Buldu, DG (corresponding author), Energyville, Thor Pk Genk 8320, B-3600 Genk, Belgium.
Keywords: multi-stack; front surface; passivation; CIGS; thin film photovoltaic
Document URI: http://hdl.handle.net/1942/35905
ISBN: 978-1-6654-1922-2
DOI: 10.1109/PVSC43889.2021.9518838
ISI #: WOS:000701690400270
Category: C1
Type: Proceedings Paper
Validations: ecoom 2022
Appears in Collections:Research publications

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