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Title: | Microplasma Illumination Enhancement in N plus P-Co-Ion-Implanted Nanocrystalline Diamond Films | Authors: | Sethy, Salila Kumar Sankaran, Kamatchi Jothiramalingam Gupta, Prasanth Thomas, Joseph Palathinkal Dash, Ajit Kennedy, John V. Leung, Kam Tong HAENEN, Ken |
Issue Date: | 2023 | Publisher: | WILEY-V C H VERLAG GMBH | Source: | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, | Status: | Early view | Abstract: | N- and P-co-ion implantation enhances the electrical conductivity of nanocrystalline diamond films to 6.9 s cm(-1) and improves the microplasma illumination (MI) characteristics of the films to a low breakdown voltage of 340 V, large plasma current density of 6.3 mA cm(-2) (@510 V) with plasma life-time stability of 10 h. N ions induce nanographitic phases in the films and P ions lower the resistance at the diamond-to-Si interface together promoting the conducting channels for effective electron transport, consequently attaining the improved MI properties of the films. | Notes: | Sankaran, KJ (corresponding author), CSIR Inst Minerals & Mat Technol, Bhubaneswar 751013, India.; Sankaran, KJ (corresponding author), Acad Sci & Innovat Res AcSIR, CSIR IMMT Campus, Ghaziabad 201002, India. kjsankaran@immt.res.in |
Keywords: | co-ion implantation;electrical conductivity;grain boundaries;graphite;microplasma illumination;nanocrystalline diamond | Document URI: | http://hdl.handle.net/1942/40828 | ISSN: | 1862-6300 | e-ISSN: | 1862-6319 | DOI: | 10.1002/pssa.202300157 | ISI #: | 001052216300001 | Rights: | 2023 Wiley-VCH GmbH | Category: | A1 | Type: | Journal Contribution |
Appears in Collections: | Research publications |
Files in This Item:
File | Description | Size | Format | |
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Microplasma Illumination Enhancement in N+P‐Co‐Ion‐Implanted Nanocrystalline Diamond Films.pdf Restricted Access | Early view | 2.27 MB | Adobe PDF | View/Open Request a copy |
auteursversie.pdf | Peer-reviewed author version | 1.97 MB | Adobe PDF | View/Open |
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