Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/4164
Full metadata record
DC FieldValueLanguage
dc.contributor.authorHikavyy, A.-
dc.contributor.authorClauws, P.-
dc.contributor.authorVanbesien, K.-
dc.contributor.authorDe Visschere, P.-
dc.contributor.authorWILLIAMS, Oliver-
dc.contributor.authorDAENEN, Michael-
dc.contributor.authorHAENEN, Ken-
dc.contributor.authorButler, J. E.-
dc.contributor.authorFeygelson, T.-
dc.date.accessioned2007-12-11T09:23:54Z-
dc.date.available2007-12-11T09:23:54Z-
dc.date.issued2007-
dc.identifier.citationDIAMOND AND RELATED MATERIALS, 16(4-7). p. 983-986-
dc.identifier.issn0925-9635-
dc.identifier.urihttp://hdl.handle.net/1942/4164-
dc.description.abstractZnO thin films were successfully prepared on boron-doped nanocrystalline diamond NCD by means of atomic layer chemical vapour deposition. Their growth and properties are similar to the layers grown by the same technique on glass. The layers thickness can be easily monitored by the number of precursors pulses. The ZnO layers are uniform and have perfect adhesion to NCD. Electrical measurements show that there is no current rectification if highly doped NCD and low resistance ALCVD ZnO are used. On the contrary, a rectifying behaviour can be obtained if lightly boron-doped NCD and resistive hydrothermally prepared ZnO are used. (c) 2006 Elsevier B.V. All rights reserved.-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA-
dc.subject.otherZnO; nanocrystalline diamond; ALCVD-
dc.titleAtomic layer deposition of ZnO thin films on boron-doped nanocrystalline diamond-
dc.typeJournal Contribution-
dc.identifier.epage986-
dc.identifier.issue4-7-
dc.identifier.spage983-
dc.identifier.volume16-
local.format.pages4-
local.bibliographicCitation.jcatA1-
dc.description.notesUniv Ghent, B-9000 Ghent, Belgium. Hasselt Univ, IMO, Inst Mat Res, B-3590 Diepenbeek, Belgium. IMEC VZW, Div IMOMEC, B-3590 Diepenbeek, Belgium. USN, Res Lab, Washington, DC 20375 USA.Hikavyy, A, Univ Ghent, Krijgslaan 281, B-9000 Ghent, Belgium.Andriy.Hikavvy@imec.be-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.bibliographicCitation.oldjcatA1-
dc.identifier.doi10.1016/j.diamond.2006.11.035-
dc.identifier.isi000246608200067-
item.accessRightsClosed Access-
item.fullcitationHikavyy, A.; Clauws, P.; Vanbesien, K.; De Visschere, P.; WILLIAMS, Oliver; DAENEN, Michael; HAENEN, Ken; Butler, J. E. & Feygelson, T. (2007) Atomic layer deposition of ZnO thin films on boron-doped nanocrystalline diamond. In: DIAMOND AND RELATED MATERIALS, 16(4-7). p. 983-986.-
item.contributorHikavyy, A.-
item.contributorClauws, P.-
item.contributorVanbesien, K.-
item.contributorDe Visschere, P.-
item.contributorWILLIAMS, Oliver-
item.contributorDAENEN, Michael-
item.contributorHAENEN, Ken-
item.contributorButler, J. E.-
item.contributorFeygelson, T.-
item.fulltextNo Fulltext-
item.validationecoom 2008-
crisitem.journal.issn0925-9635-
crisitem.journal.eissn1879-0062-
Appears in Collections:Research publications
Show simple item record

SCOPUSTM   
Citations

20
checked on Sep 3, 2020

WEB OF SCIENCETM
Citations

19
checked on Apr 22, 2024

Page view(s)

144
checked on Jul 28, 2023

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.