Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/5288
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dc.contributor.authorCZECH, I.-
dc.contributor.authorDE SCHEPPER, Luc-
dc.contributor.authorSTALS, Lambert-
dc.contributor.authorRoggen, J.-
dc.contributor.authorHuyberechts, G.-
dc.date.accessioned2007-12-20T15:57:21Z-
dc.date.available2007-12-20T15:57:21Z-
dc.date.issued1996-
dc.identifier.citationProceedings TAFT ""96: 5th international symposium on trends and new applications in thin films, 1-3 april, Colmar (France). p. 131-133.-
dc.identifier.urihttp://hdl.handle.net/1942/5288-
dc.titleOn the deposition and characterization of thin SnO2 films-
dc.typeProceedings Paper-
dc.identifier.epage133-
dc.identifier.spage131-
local.type.specifiedProceedings Paper-
dc.bibliographicCitation.oldjcat-
local.bibliographicCitation.btitleProceedings TAFT ""96: 5th international symposium on trends and new applications in thin films, 1-3 april, Colmar (France)-
item.fulltextNo Fulltext-
item.contributorRoggen, J.-
item.contributorHuyberechts, G.-
item.contributorCZECH, I.-
item.contributorDE SCHEPPER, Luc-
item.contributorSTALS, Lambert-
item.fullcitationCZECH, I.; DE SCHEPPER, Luc; STALS, Lambert; Roggen, J. & Huyberechts, G. (1996) On the deposition and characterization of thin SnO2 films. In: Proceedings TAFT ""96: 5th international symposium on trends and new applications in thin films, 1-3 april, Colmar (France). p. 131-133..-
item.accessRightsClosed Access-
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