Please use this identifier to cite or link to this item:
http://hdl.handle.net/1942/8139
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DC Field | Value | Language |
---|---|---|
dc.contributor.author | DE CEUNINCK, Ward | - |
dc.contributor.author | D'Haeger, V | - |
dc.contributor.author | Stulens, Herwig | - |
dc.contributor.author | DE SCHEPPER, Luc | - |
dc.contributor.author | STALS, Lambert | - |
dc.date.accessioned | 2008-04-04T14:48:11Z | - |
dc.date.available | 2008-04-04T14:48:11Z | - |
dc.date.issued | 1994 | - |
dc.identifier.citation | Murarka, SP Katz, A Tu, KN Maex, K (Ed.) ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY. p. 663-668. | - |
dc.identifier.isbn | 1-55899-237-5 | - |
dc.identifier.issn | 0272-9172 | - |
dc.identifier.uri | http://hdl.handle.net/1942/8139 | - |
dc.language.iso | en | - |
dc.publisher | MATERIALS RESEARCH SOC | - |
dc.relation.ispartofseries | MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS | - |
dc.title | Reliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scale | - |
dc.type | Proceedings Paper | - |
local.bibliographicCitation.authors | Murarka, SP Katz, A Tu, KN Maex, K | - |
local.bibliographicCitation.conferencedate | APR 04-08, 1994 | - |
local.bibliographicCitation.conferencename | Symposium on Advanced Metallization for Devices and Circuits: Science, Technology and Manufacturability | - |
local.bibliographicCitation.conferenceplace | SAN FRANCISCO, CA | - |
dc.identifier.epage | 668 | - |
dc.identifier.spage | 663 | - |
dc.identifier.volume | 337 | - |
local.format.pages | 6 | - |
dc.description.notes | LIMBURGS UNIV CENTRUM, INST MAT RES, DIV MAT PHYS, DIEPENBEEK, B-3590 BELGIUM. | - |
local.type.refereed | Refereed | - |
local.type.specified | Proceedings Paper | - |
dc.bibliographicCitation.oldjcat | C1 | - |
dc.identifier.isi | A1994BB59J00086 | - |
local.bibliographicCitation.btitle | ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY | - |
item.accessRights | Closed Access | - |
item.fullcitation | DE CEUNINCK, Ward; D'Haeger, V; Stulens, Herwig; DE SCHEPPER, Luc & STALS, Lambert (1994) Reliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scale. In: Murarka, SP Katz, A Tu, KN Maex, K (Ed.) ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY. p. 663-668.. | - |
item.contributor | DE CEUNINCK, Ward | - |
item.contributor | D'Haeger, V | - |
item.contributor | Stulens, Herwig | - |
item.contributor | DE SCHEPPER, Luc | - |
item.contributor | STALS, Lambert | - |
item.fulltext | No Fulltext | - |
Appears in Collections: | Research publications |
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