Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/8139
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dc.contributor.authorDE CEUNINCK, Ward-
dc.contributor.authorD'Haeger, V-
dc.contributor.authorStulens, Herwig-
dc.contributor.authorDE SCHEPPER, Luc-
dc.contributor.authorSTALS, Lambert-
dc.date.accessioned2008-04-04T14:48:11Z-
dc.date.available2008-04-04T14:48:11Z-
dc.date.issued1994-
dc.identifier.citationMurarka, SP Katz, A Tu, KN Maex, K (Ed.) ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY. p. 663-668.-
dc.identifier.isbn1-55899-237-5-
dc.identifier.issn0272-9172-
dc.identifier.urihttp://hdl.handle.net/1942/8139-
dc.language.isoen-
dc.publisherMATERIALS RESEARCH SOC-
dc.relation.ispartofseriesMATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS-
dc.titleReliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scale-
dc.typeProceedings Paper-
local.bibliographicCitation.authorsMurarka, SP Katz, A Tu, KN Maex, K-
local.bibliographicCitation.conferencedateAPR 04-08, 1994-
local.bibliographicCitation.conferencenameSymposium on Advanced Metallization for Devices and Circuits: Science, Technology and Manufacturability-
local.bibliographicCitation.conferenceplaceSAN FRANCISCO, CA-
dc.identifier.epage668-
dc.identifier.spage663-
dc.identifier.volume337-
local.format.pages6-
dc.description.notesLIMBURGS UNIV CENTRUM, INST MAT RES, DIV MAT PHYS, DIEPENBEEK, B-3590 BELGIUM.-
local.type.refereedRefereed-
local.type.specifiedProceedings Paper-
dc.bibliographicCitation.oldjcatC1-
dc.identifier.isiA1994BB59J00086-
local.bibliographicCitation.btitleADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY-
item.fulltextNo Fulltext-
item.contributorDE CEUNINCK, Ward-
item.contributorD'Haeger, V-
item.contributorStulens, Herwig-
item.contributorDE SCHEPPER, Luc-
item.contributorSTALS, Lambert-
item.fullcitationDE CEUNINCK, Ward; D'Haeger, V; Stulens, Herwig; DE SCHEPPER, Luc & STALS, Lambert (1994) Reliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scale. In: Murarka, SP Katz, A Tu, KN Maex, K (Ed.) ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY. p. 663-668..-
item.accessRightsClosed Access-
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