Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/9038
Title: Influence of deposition conditions on the crystal structure of MOS2 coating
Authors: WANG, Jihui
Xia, Y.
WIEERS, Els 
STALS, Lambert 
ZHANG, Xiaoe
Celis, J.P.
Issue Date: 2006
Publisher: JOURNAL MATER SCI TECHNOL
Source: JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 22(3). p. 324-328
Abstract: MoS2 coatings were prepared using an unbalanced bipolar pulsed DC (direct current) magnetron sputtering apparatus under different targets, cathode current densities, power modes and bias voltages. The morphology, structure and growth characteristics of MoS2 Coatings were observed and identified respectively by scanning electron microscopy, X-ray diffractometry and mass spectrometry. The results show that MoS2 coatings evolve with the (002) basal plane parallel to the surface by using cold pressed target with lower density, lower cathodic current density, bipolar pulse DC power and minus bias voltage, whereas the coatings deposited under hot pressed target, higher cathodic current density, simple DC power and positive bias voltage have the (002) basal plane perpendicular to the surface. The influence of deposition conditions on the crystal structure of MoS2 coating is implemented by altering its growth rate and the energy of sputtering-deposition particles.
Notes: Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China. Limburgs Univ Ctr, Mat Res Inst, B-3590 Diepenbeek, Belgium. Katholieke Univ Leuven, Dept Met & Mat Engn, B-3001 Heverlee, Belgium.
Keywords: deposition condition; molybdenum disulfide; coating; crystal structure
Document URI: http://hdl.handle.net/1942/9038
ISSN: 1005-0302
e-ISSN: ****-****
ISI #: 000238133800009
Category: A1
Type: Journal Contribution
Validations: ecoom 2007
Appears in Collections:Research publications

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