Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/9820
Full metadata record
DC FieldValueLanguage
dc.contributor.authorHARDY, An-
dc.contributor.authorAdelmann, C.-
dc.contributor.authorVan Elshocht, S.-
dc.contributor.authorVAN DEN RUL, Heidi-
dc.contributor.authorVAN BAEL, Marlies-
dc.contributor.authorDe Gendt, S.-
dc.contributor.authorD'OLIESLAEGER, Marc-
dc.contributor.authorHeyns, M.-
dc.contributor.authorKittl, J.A.-
dc.contributor.authorMULLENS, Jules-
dc.date.accessioned2009-08-19T13:04:44Z-
dc.date.availableWITHHELD_ONE_YEAR-
dc.date.issued2009-
dc.identifier.citationAPPLIED SURFACE SCIENCE, 255(17). p. 7812-7817-
dc.identifier.issn0169-4332-
dc.identifier.urihttp://hdl.handle.net/1942/9820-
dc.description.abstractGrazing angle attenuated total reflectance Fourier transform infrared spectroscopy is applied to study ultrathin film Hf4+, Sc3+ and Dy3+ oxides, due to its high surface sensitivity. The (multi) metal oxides studied, are of interest as high-k dielectrics. Important properties affecting the permittivity, such as the amorphous or crystalline phase and interfacial reactions, are characterized. Dy2O3 is prone to silicate formation on SiO2/Si substrates, which is expressed in DyScO3 as well, but suppressed in HfDyOx. Sc2O3, HfScOx and HfO2 were found to be stable in contact with SiO2/Si. Deposition of HfO2 in between Dy2O3 or DyScO3 and SiO2, prevents silicate formation, showing a buffer-like behavior for the HfO2. Doping of HfO2 with Dy or Sc prevents monoclinic phase crystallization. Instead, a cubic phase is obtained, which allows a higher permittivity of the films. The phase remains stable after anneal at high temperature. (c) 2009 Elsevier B.V. All rights reserved.-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.subject.otherATR-FTIR; Hafnia; Scandate; Rare earth; High permittivity-
dc.titleStudy of interfacial reactions and phase stabilization of mixed Sc, Dy, Hf high-k oxides by attenuated total reflectance infrared spectroscopy-
dc.typeJournal Contribution-
dc.identifier.epage7817-
dc.identifier.issue17-
dc.identifier.spage7812-
dc.identifier.volume255-
local.format.pages6-
local.bibliographicCitation.jcatA1-
dc.description.notes[Hardy, A.; Van den Rul, H.; Van Bael, M. K.; Mullens, J.] Hasselt Univ, Inorgan & Phys Chem IMO, B-3590 Diepenbeek, Belgium. [Hardy, A.; Van den Rul, H.; Van Bael, M. K.; D'Olieslaeger, M.] IMEC VZW, Div IMOMEC, Diepenbeek, Belgium. [Adelmann, C.; Van Elshocht, S.; De Gendt, S.; Heyns, M.; Kittl, J. A.] IMEC VZW, Heverlee, Belgium. [D'Olieslaeger, M.] Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium. [De Gendt, S.; Heyns, M.] Katholieke Univ Leuven, Dept Chem, B-3001 Heverlee, Belgium.-
local.type.refereedRefereed-
local.type.specifiedArticle-
dc.bibliographicCitation.oldjcatA1-
dc.identifier.doi10.1016/j.apsusc.2009.04.184-
dc.identifier.isi000266567400061-
item.accessRightsOpen Access-
item.fulltextWith Fulltext-
item.validationecoom 2010-
item.contributorHARDY, An-
item.contributorAdelmann, C.-
item.contributorVan Elshocht, S.-
item.contributorVAN DEN RUL, Heidi-
item.contributorVAN BAEL, Marlies-
item.contributorDe Gendt, S.-
item.contributorD'OLIESLAEGER, Marc-
item.contributorHeyns, M.-
item.contributorKittl, J.A.-
item.contributorMULLENS, Jules-
item.fullcitationHARDY, An; Adelmann, C.; Van Elshocht, S.; VAN DEN RUL, Heidi; VAN BAEL, Marlies; De Gendt, S.; D'OLIESLAEGER, Marc; Heyns, M.; Kittl, J.A. & MULLENS, Jules (2009) Study of interfacial reactions and phase stabilization of mixed Sc, Dy, Hf high-k oxides by attenuated total reflectance infrared spectroscopy. In: APPLIED SURFACE SCIENCE, 255(17). p. 7812-7817.-
crisitem.journal.issn0169-4332-
crisitem.journal.eissn1873-5584-
Appears in Collections:Research publications
Files in This Item:
File Description SizeFormat 
27.pdfPublished version372.88 kBAdobe PDFView/Open
Show simple item record

SCOPUSTM   
Citations

33
checked on Sep 2, 2020

WEB OF SCIENCETM
Citations

34
checked on Mar 29, 2024

Page view(s)

66
checked on Aug 31, 2022

Download(s)

206
checked on Aug 31, 2022

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.