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Title: | Atomic Layer Deposition of Gadolinium Aluminate using Gd((PrCp)-Pr-i)(3), TMA, and O-3 or H2O | Authors: | Adelmann, Christoph Pierreux, Dieter Swerts, Johan DEWULF, Daan HARDY, An TIELENS, Hilde Franquet, Alexis Brijs, Bert Moussa, Alain Conard, Thierry VAN BAEL, Marlies Maes, Jan W. Jurczak, Malgorzata Kittl, Jorge A. Van Elshocht, Sven |
Issue Date: | 2010 | Publisher: | WILEY-V C H VERLAG GMBH | Source: | CHEMICAL VAPOR DEPOSITION, 16 (4-6). p. 170-178 | Abstract: | For future generations of non-volatile memory applications, the replacement of the interpoly dielectric by a suitable high-K material is required. Rare-earth aluminates are potential candidates because they are predicted to combine a high dielectric permittivity with a large band gap. We demonstrate the atomic layer deposition (ALD) of GdxAl2O3 layers using Gd((PrCp)-Pr-i)(3), trimethyl-aluminum (TMA), and H2O or O-3. Process windows for both H2O and O3 as oxidants are explored. H2O is shown to lead to better GdxAl2-xO3 film properties than O-3, although the accessible composition range is limited because of the hygroscopic nature of Gd2O3. | Notes: | [Adelmann, Christoph; Swerts, Johan; Tielens, Hilde; Franquet, Alexis; Brijs, Bert; Moussa, Alain; Conard, Thierry; Jurczak, Malgorzata; Kittl, Jorge A.; Van Elshocht, Sven] IMEC VZW, B-3001 Louvain, Belgium. [Pierreux, Dieter; Maes, Jan W.] ASM Belgium, B-3001 Louvain, Belgium. [Dewulf, Dann; Hardy, An; Van Bael, Marlies K.] Hasselt Univ, Inst Mat Res Inorgan & Phys Chem, B-3590 Diepenbeek, Belgium. [Dewulf, Dann; Hardy, An; Van Bael, Marlies K.] IMEC VZW, Div IMOMEC, B-3590 Diepenbeek, Belgium. adelmann@imec.be | Keywords: | ALD; Cyclopentadienyl; Gadolinium aluminate; Gadolinium oxide; High-kappa oxides | Document URI: | http://hdl.handle.net/1942/11111 | ISSN: | 0948-1907 | DOI: | 10.1002/cvde.200906833 | ISI #: | 000279984800008 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2011 |
Appears in Collections: | Research publications |
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