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http://hdl.handle.net/1942/11862
Title: | Stabilization of ambient sensitive atomic layer deposited lanthanum aluminates by annealing and in situ capping | Authors: | Swerts, J. GIELIS, Sven Vereecke, G. HARDY, An DEWULF, Daan Adelmann, C. VAN BAEL, Marlies Van Elshocht, S. |
Issue Date: | 2011 | Publisher: | AMER INST PHYSICS | Source: | APPLIED PHYSICS LETTERS, 98(10) | Abstract: | We have studied the effect of air exposure on lanthanum aluminates (LaAlOx) deposited by atomic layer deposition. Fourier transform infrared spectroscopy and thermal desorption spectroscopy of as-deposited LaAlOx showed that H2O is absorbed during air exposure and that the amount of absorbed H2O increases with increasing La atomic percent. C was found to be incorporated already during deposition in the form of carbonates. H2O and CO2 are outgassed during postdeposition annealing in an inert atmosphere. After a 700 degrees C postdeposition anneal, the LaAlOx becomes resistant against H2O absorption due to film densification. Alternatively, in situ capping of the LaAlOx with a similar to 2 nm thin Al2O3 film protects the LaAlOx against H2O absorption, but it also hinders the outgassing of the C contaminants during a postdeposition anneal. (C) 2011 American Institute of Physics. [doi:10.1063/1.3557501] | Notes: | [Swerts, J.; Gielis, S.; Vereecke, G.; Adelmann, C.; Van Elshocht, S.] IMEC VZW, B-3001 Louvain, Belgium. [Gielis, S.] Katholieke Univ Leuven, Dept Chem, B-3001 Louvain, Belgium. [Hardy, A.; Dewulf, D.; Van Bael, M. K.] Hasselt Univ, IMO, Div IMOMEC, B-3590 Diepenbeek, Belgium. [Hardy, A.; Dewulf, D.; Van Bael, M. K.] Hasselt Univ, IMEC, Div IMOMEC, B-3590 Diepenbeek, Belgium. | Document URI: | http://hdl.handle.net/1942/11862 | ISSN: | 0003-6951 | e-ISSN: | 1077-3118 | DOI: | 10.1063/1.3557501 | ISI #: | 000288277200058 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2012 |
Appears in Collections: | Research publications |
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