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http://hdl.handle.net/1942/12211
Title: | Aqueous Solutions for Low-Temperature Photoannealing of Functional Oxide Films: Reaching the 400 degrees C Si-Technology Integration Barrier | Authors: | DE DOBBELAERE, Christopher Lourdes Calzada, Maria Jimenez, Ricardo Ricote, Jesus Bretos, Inigo MULLENS, Jules HARDY, An VAN BAEL, Marlies |
Issue Date: | 2011 | Publisher: | AMER CHEMICAL SOC | Source: | JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 133(33). p. 12922-12925 | Abstract: | Functional oxide films were obtained at low temperature by combination of aqueous precursors and a UV-assisted annealing process (aqueous photochemical solution deposition). For a PbTiO(3) model system, functional ferroelectric perovskite films were prepared at only 400 degrees C, a temperature compatible with the current Si-technology demands. Intrinsically photosensitive and environmentally friendly aqueous precursors can be prepared for most of the functional multimetal oxides, as additionally demonstrated here for multiferroic BiFeO(3), yielding virtually unlimited possibilities for this low-temperature fabrication technology. | Notes: | [De Dobbelaere, C; Mullens, J; Hardy, A; Van Bael, MK] Univ Hasselt, IMEC VZW, Div IMOMEC, Inorgan & Phys Chem Grp,Inst Mat Res, B-3590 Diepenbeek, Belgium [Calzada, ML; Jimenez, R; Ricote, J; Bretos, I] CSIC, Inst Ciencia Mat Madrid, E-28049 Madrid, Spain | Document URI: | http://hdl.handle.net/1942/12211 | ISSN: | 0002-7863 | e-ISSN: | 1520-5126 | DOI: | 10.1021/ja203553n | ISI #: | 000294591300008 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2012 |
Appears in Collections: | Research publications |
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