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http://hdl.handle.net/1942/1431
Title: | Compositional and electrical characterisation of the hydrogen-oxygen terminated diamond (100) surface | Authors: | DEFERME, Wim HAENEN, Ken Tanasa, G. Flipse, C.F.J. NESLADEK, Milos |
Issue Date: | 2006 | Publisher: | Wiley | Source: | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 203(12). p. 3114-3120 | Abstract: | In this work (100) diamond films are hydrogenated using a conventional MWPE-CVD (microwave plasma enhanced chemical vapour deposition) reactor containing a H2 or a H2/O2 mixture. For the latter, XPS (X-ray Photoelectron Spectroscopy) experiments show an increased presence of oxygen at the (sub)-surface. Contrary to pure H2-plasma treated samples, H2/O2-treated layers still posses enough conductivity to enable STS (Scanning Tunneling Spectroscopy) investigations to be carried out after an annealing at 410 °C in UHV (Ultra High Vacuum). Evidence for surface resonance states is detected, yielding a possible explanation for the measured conductivity. UPS (UV Photoelectron Spectroscopy) data point to a negative electron affinity of -0.3 eV for the H2/O2-treated layers. | Document URI: | http://hdl.handle.net/1942/1431 | ISSN: | 0031-8965 | e-ISSN: | 1862-6319 | DOI: | 10.1002/pssa.200671125 | ISI #: | 000240967400020 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2007 |
Appears in Collections: | Research publications |
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