Please use this identifier to cite or link to this item:
|Title:||Compositional and electrical characterisation of the hydrogen-oxygen terminated diamond (100) surface||Authors:||DEFERME, Wim
|Issue Date:||2006||Publisher:||Wiley||Source:||PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 203(12). p. 3114-3120||Abstract:||In this work (100) diamond films are hydrogenated using a conventional MWPE-CVD (microwave plasma enhanced chemical vapour deposition) reactor containing a H2 or a H2/O2 mixture. For the latter, XPS (X-ray Photoelectron Spectroscopy) experiments show an increased presence of oxygen at the (sub)-surface. Contrary to pure H2-plasma treated samples, H2/O2-treated layers still posses enough conductivity to enable STS (Scanning Tunneling Spectroscopy) investigations to be carried out after an annealing at 410 °C in UHV (Ultra High Vacuum). Evidence for surface resonance states is detected, yielding a possible explanation for the measured conductivity. UPS (UV Photoelectron Spectroscopy) data point to a negative electron affinity of -0.3 eV for the H2/O2-treated layers.||Document URI:||http://hdl.handle.net/1942/1431||ISSN:||0031-8965||DOI:||10.1002/pssa.200671125||ISI #:||000240967400020||Category:||A1||Type:||Journal Contribution||Validations:||ecoom 2007|
|Appears in Collections:||Research publications|
Show full item record
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.