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Title: | Hydrogen termination of CVD diamond films by high-temperature annealing at atmospheric pressure | Authors: | Seshan, V. Ullien, D. Castellanos-Gomez, A. Sachdeva, S. Murthy, D. H. K. Savenije, T. J. Ahmad, Hakeem A. Nunney, T. S. JANSSENS, Stoffel HAENEN, Ken NESLADEK, Milos van der Zant, H. S. J. Sudholter, E. J. R. de Smet, L. C. P. M. |
Issue Date: | 2013 | Publisher: | AMER INST PHYSICS | Source: | JOURNAL OF CHEMICAL PHYSICS, 138 (23) | Abstract: | A high-temperature procedure to hydrogenate diamond films using molecular hydrogen at atmospheric pressure was explored. Undoped and doped chemical vapour deposited (CVD) polycrystalline diamond films were treated according to our annealing method using a H-2 gas flow down to similar to 50 ml/min (STP) at similar to 850 degrees C. The films were extensively evaluated by surface wettability, electron affinity, elemental composition, photoconductivity, and redox studies. In addition, electrografting experiments were performed. The surface characteristics as well as the optoelectronic and redox properties of the annealed films were found to be very similar to hydrogen plasma-treated films. Moreover, the presented method is compatible with atmospheric pressure and provides a low-cost solution to hydrogenate CVD diamond, which makes it interesting for industrial applications. The plausible mechanism for the hydrogen termination of CVD diamond films is based on the formation of surface carbon dangling bonds and carbon-carbon unsaturated bonds at the applied temperature, which react with molecular hydrogen to produce a hydrogen-terminated surface. (C) 2013 AIP Publishing LLC. | Notes: | [Seshan, V.; Ullien, D.; Sachdeva, S.; Murthy, D. H. K.; Savenije, T. J.; Ahmad, H. A.; Sudholter, E. J. R.; de Smet, L. C. P. M.] Delft Univ Technol, Dept Chem Engn, NL-2628 BL Delft, Netherlands. [Seshan, V.; Castellanos-Gomez, A.; van der Zant, H. S. J.] Delft Univ Technol, Kavli Inst Nanosci, NL-2628 CJ Delft, Netherlands. [Nunney, T. S.] Thermo Fisher Sci, E Grinstead RH19 1UB, W Sussex, England. [Janssens, S. D.; Haenen, K.; Nesladek, M.] Hasselt Univ, Inst Mat Res IMO, BE-3590 Diepenbeek, Belgium. [Janssens, S. D.; Haenen, K.; Nesladek, M.] IMEC VZW, IMOMEC, BE-3590 Diepenbeek, Belgium. l.c.p.m.desmet@tudelft.nl | Keywords: | Physics, Atomic, Molecular & Chemical | Document URI: | http://hdl.handle.net/1942/15376 | ISSN: | 0021-9606 | e-ISSN: | 1089-7690 | DOI: | 10.1063/1.4810866 | ISI #: | 000321012400032 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2014 |
Appears in Collections: | Research publications |
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