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Title: | Structural and dielectric properties of parylene-VT4 thin films | Authors: | Kahouli, A. Sylvestre, A. Laithier, J. -F. LUTSEN, Laurence Pairis, S. Andre, E. Garden, J. -L. |
Issue Date: | 2014 | Source: | MATERIALS CHEMISTRY AND PHYSICS, 143 (3), p. 908-914 | Abstract: | 58% semi-crystalline thin parylene-VT4 (eH2CeC6F4eCH2 )n films, have been investigated by dielectric spectroscopy for temperature and frequency ranges of [ 120 to 380 C] and [0.1e105 Hz] respectively. The study comprises a detailed investigation of the dielectric constant, dielectric loss and AC conductivity of this fluoropolymer. Dielectric behavior of parylene-VT4 is represented by a low dielectric constant with values in the range of 2.05e2.35 while the dielectric losses indicate the presence of two relaxation processes. Maxwell Wagner Sillars (MWS) polarization at the amorphous/crystalline interfaces with activation energy of 1.6 eV is due to the oligomer orientation. Electrical conductivity obeys to the well-known Jonscher law. The plateau in the low frequency part of this conductivity is temperature-dependent and follows an Arrhenius behavior with activation energy of 1.17 eV (deep traps) due to the fluorine diffusion. Due to its thermal stability with a high decomposition temperature (around 400 C under air and 510 C under nitrogen) and due to its good resistivity at low frequency (1015e1017 U m 1), parylene-VT4 constitutes a very attractive polymer for microelectronic applications as low k dielectric. Moreover, when parylene-VT4 is subjected to an annealing, the dielectric properties can be still more improved. | Notes: | Kahouli, A (reprint author), [Show the Organization-Enhanced name(s)] Univ Grenoble 1, Grenoble Elect Engn Lab, G INP, CNRS, 25 Rue Martyrs,BP 166, F-38042 Grenoble 9, France. kahouli.kader@gmail.com | Keywords: | polymers; thin films; vapor deposition; dielectric properties; annealing | Document URI: | http://hdl.handle.net/1942/16748 | ISSN: | 0254-0584 | e-ISSN: | 1879-3312 | DOI: | 10.1016/j.matchemphys.2013.08.044 | ISI #: | 000331347500004 | Rights: | © 2013 Elsevier B.V. All rights reserved. | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2015 |
Appears in Collections: | Research publications |
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