Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/16748
Title: Structural and dielectric properties of parylene-VT4 thin films
Authors: Kahouli, A.
Sylvestre, A.
Laithier, J. -F.
LUTSEN, Laurence 
Pairis, S.
Andre, E.
Garden, J. -L.
Issue Date: 2014
Source: MATERIALS CHEMISTRY AND PHYSICS, 143 (3), p. 908-914
Abstract: 58% semi-crystalline thin parylene-VT4 (eH2CeC6F4eCH2 )n films, have been investigated by dielectric spectroscopy for temperature and frequency ranges of [ 120 to 380 C] and [0.1e105 Hz] respectively. The study comprises a detailed investigation of the dielectric constant, dielectric loss and AC conductivity of this fluoropolymer. Dielectric behavior of parylene-VT4 is represented by a low dielectric constant with values in the range of 2.05e2.35 while the dielectric losses indicate the presence of two relaxation processes. Maxwell Wagner Sillars (MWS) polarization at the amorphous/crystalline interfaces with activation energy of 1.6 eV is due to the oligomer orientation. Electrical conductivity obeys to the well-known Jonscher law. The plateau in the low frequency part of this conductivity is temperature-dependent and follows an Arrhenius behavior with activation energy of 1.17 eV (deep traps) due to the fluorine diffusion. Due to its thermal stability with a high decomposition temperature (around 400 C under air and 510 C under nitrogen) and due to its good resistivity at low frequency (1015e1017 U m 1), parylene-VT4 constitutes a very attractive polymer for microelectronic applications as low k dielectric. Moreover, when parylene-VT4 is subjected to an annealing, the dielectric properties can be still more improved.
Notes: Kahouli, A (reprint author), [Show the Organization-Enhanced name(s)] Univ Grenoble 1, Grenoble Elect Engn Lab, G INP, CNRS, 25 Rue Martyrs,BP 166, F-38042 Grenoble 9, France. kahouli.kader@gmail.com
Keywords: polymers; thin films; vapor deposition; dielectric properties; annealing
Document URI: http://hdl.handle.net/1942/16748
ISSN: 0254-0584
e-ISSN: 1879-3312
DOI: 10.1016/j.matchemphys.2013.08.044
ISI #: 000331347500004
Rights: © 2013 Elsevier B.V. All rights reserved.
Category: A1
Type: Journal Contribution
Validations: ecoom 2015
Appears in Collections:Research publications

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