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http://hdl.handle.net/1942/18762
Title: | Rapid fabrication of micron-sized CVD-diamond structures by microfluidic contact printing | Authors: | VANDENRYT, Thijs GRIETEN, Lars JANSSENS, Stoffel VAN GRINSVEN, Bart HAENEN, Ken RUTTENS, Bart D'HAEN, Jan WAGNER, Patrick THOELEN, Ronald DE CEUNINCK, Ward |
Issue Date: | 2014 | Publisher: | WILEY-V C H VERLAG GMBH | Source: | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 211 (6), p. 1448-1454 | Abstract: | In this contribution we report on a novel method for the growth of laterally patterned synthetic diamond films with submicron feature sizes. The lateral patterning is induced by depositing a nanodiamond-based seeding layer prior to the chemical vapor deposition of the diamond films. The seeding layer is prepared by a microfluidic approach, based on soft lithography with PDMS moulds, used in the microcontact printing. These moulds are prepared by electron-beam lithography of photoresist on silicon substrates. The master moulds are reusable, allowing for cheap, high-throughput manufacturing, and the resulting diamond microstructures exhibit an outstanding smoothness and structural reproducibility. Possible applications are expected in the fields of diamond electronics, micro-electro-mechanical systems (MEMS) as well as bio- and chemosensors. The abstract figure shows the SU-8 master mould (left). The resulting diamond structure (right) is shown, after chemical vapor deposition. The purple color originates from the settings of the optical microscope, used to get a high-contrast image. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | Notes: | [Vandenryt, Thijs; Grieten, Lars; Janssens, Stoffel D.; van Grinsven, Bart; Haenen, Ken; Ruttens, Bart; D'Haen, Jan; Wagner, Patrick; Thoelen, Ronald; De Ceuninck, Ward] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Janssens, Stoffel D.; Haenen, Ken; Ruttens, Bart; D'Haen, Jan; Wagner, Patrick; De Ceuninck, Ward] IMEC VZW, Div IMOMEC, B-3590 Diepenbeek, Belgium. | Keywords: | chemical vapor deposition; electron-beam lithography; micro- and nanowires; microfluidics; PDMS; soft lithography; synthetic diamond;chemical vapor deposition; electron-beam lithography; micro- and nanowires; microfluidics; PDMS; soft lithography; synthetic diamond | Document URI: | http://hdl.handle.net/1942/18762 | ISSN: | 1862-6300 | e-ISSN: | 1862-6319 | DOI: | 10.1002/pssa.201330665 | ISI #: | 000337759000036 | Rights: | © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2015 |
Appears in Collections: | Research publications |
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