On the atomistic details of electromigration-induced drift

Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/2402

Title:	On the atomistic details of electromigration-induced drift
Authors:	Proost, J D'HAEN, Jan Jin, M Verlinden, B
Issue Date:	2004
Publisher:	PERGAMON-ELSEVIER SCIENCE LTD
Source:	SCRIPTA MATERIALIA, 50(2). p. 267-271
Abstract:	Electromigration drift studies have been performed inside a SEM. Based on the observed drift mode, a grain boundary grooving model is proposed to account for the atomistic details of current-induced motion. The role of grain boundary structure in determining the local direction of groove propagation is illustrated. (C) 2003 Published by Elsevier Ltd. on behalf of Acta Materialia Inc.
Notes:	Dept Met & Mat Engn, B-3001 Louvain, Belgium. IMOMEC, B-3590 Diepenbeek, Belgium.Proost, J, Dept Met & Mat Engn, Kasteelpk Arenberg 44, B-3001 Louvain, Belgium.
Keywords:	electromigration; thin films; kinetics; grain boundary structure
Document URI:	http://hdl.handle.net/1942/2402
ISSN:	1359-6462
e-ISSN:	1872-8456
DOI:	10.1016/j.scriptamat.2003.10.005
ISI #:	000186377200016
Category:	A1
Type:	Journal Contribution
Validations:	ecoom 2004
Appears in Collections:	Research publications

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