Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/2416
Title: Direct patterning of photosensitive chemical solution deposition PZT layers
Authors: Marson, S
Dorey, RA
Zhang, Q
Whatmore, RW
HARDY, An 
MULLENS, Jules 
Issue Date: 2004
Publisher: ELSEVIER SCI LTD
Source: JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 24(6). p. 1925-1928
Abstract: A highly concentrated solution for producing photopatternable layers of lead zirconate titanate (PZT) was prepared by dissolving into acrylic acid an amorphous PZT powder which was obtained by a sol-gel process. The solution was found to be suitable for spin-coating PZT layers that are photosensitive to UV radiation. After deposition and subsequent exposure the PZT film showed a decreased solubility in several organic compounds. These properties were exploited to create features on platinised silicon (Si) substrates. A thermogravimetric analysis was performed on the solution to determine the best thermal profile for the burn out of the organics. PZT features up to 2 mum thick were obtained after the firing process. (C) 2003 Elsevier Ltd. All rights reserved.
Notes: Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England. Limburgs Univ Ctr, Lab Inorgan & Phys Chem, Diepenbeek, Belgium.Dorey, RA, Cranfield Univ, Sch Ind & Mfg Sci, Nanotechnol Grp, Cranfield MK43 0AL, Beds, England.r.a.dorey@cranfield.ac.uk
Keywords: drying; films; photopatterning; PZT; sol-gel process
Document URI: http://hdl.handle.net/1942/2416
ISSN: 0955-2219
e-ISSN: 1873-619X
DOI: 10.1016/S0955-2219(03)00543-0
ISI #: 000189247800205
Category: A1
Type: Journal Contribution
Validations: ecoom 2005
Appears in Collections:Research publications

Show full item record

SCOPUSTM   
Citations

6
checked on Sep 2, 2020

WEB OF SCIENCETM
Citations

5
checked on May 14, 2022

Page view(s)

52
checked on May 15, 2022

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.