Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/24366
Title: Thermal characterization of polycrystalline diamond thin film heat spreaders grown on GaN HEMTs
Authors: Zhou, Yan
RAMANETI, Rajesh 
Anaya, Julian
Korneychuk, Svetlana
Derluyn, Joff
Sun, Huarui
Pomeroy, James
Verbeeck, Johan
HAENEN, Ken 
Kuball, Martin
Issue Date: 2017
Publisher: AMER INST PHYSICS
Source: APPLIED PHYSICS LETTERS, 111(4), p. 1-5 (Art N° 041901)
Abstract: Polycrystalline diamond (PCD) was grown onto high-k dielectric passivated AlGaN/GaN-on-Si high electron mobility transistor (HEMT) structures, with film thicknesses ranging from 155 to 1000 nm. Transient thermoreflectance results were combined with device thermal simulations to investigate the heat spreading benefit of the diamond layer. The observed thermal conductivity (k(Dia)) of PCD films is one-to-two orders of magnitude lower than that of bulk PCD and exhibits a strong layer thickness dependence, which is attributed to the grain size evolution. The films exhibit a weak temperature dependence of k(Dia) in the measured 25-225 degrees C range. Device simulation using the experimental jDia and thermal boundary resistance values predicts at best a 15% reduction in peak temperature when the source-drain opening of a passivated AlGaN/GaN-on-Si HEMT is overgrown with PCD. Published by AIP Publishing.
Notes: [Zhou, Yan; Anaya, Julian; Sun, Huarui; Pomeroy, James; Kuball, Martin] Univ Bristol, CDTR, HH Wills Phys Lab, Tyndall Ave, Bristol BS8 1TL, Avon, England. [Ramaneti, Rajesh; Haenen, Ken] Hasselt Univ, Inst Mat Res IMO, Wetenschapspk 1, B-3590 Diepenbeek, Belgium. [Ramaneti, Rajesh; Haenen, Ken] IMEC vzw, IMOMEC, Wetenschapspk 1, B-3590 Diepenbeek, Belgium. [Korneychuk, Svetlana; Verbeeck, Johan] Univ Antwerp, Elect Microscopy Mat Sci EMAT, Groenenborgerlaan 171, B-2020 Antwerp, Belgium. [Derluyn, Joff] EpiGaN NV, Kempische Steenweg 293, B-3500 Hasselt, Belgium.
Document URI: http://hdl.handle.net/1942/24366
ISSN: 0003-6951
e-ISSN: 1077-3118
DOI: 10.1063/1.4995407
ISI #: 000406779700008
Rights: (c) Published by AIP Publishing.
Category: A1
Type: Journal Contribution
Validations: ecoom 2018
Appears in Collections:Research publications

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